Patents by Inventor Dmitri G. Starodub

Dmitri G. Starodub has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10957568
    Abstract: Disclosed are methods and apparatus for facilitating defect detection in a multilayer stack. The method includes selection of a set of structure parameters for modeling a particular multilayer stack and a particular defect contained within such particular multilayer stack and a set of operating parameters for an optical inspection system. Based on the set of structure and operating parameters, an electromagnetic simulation is performed of waves scattered from the particular multilayer stack and defect and arriving at a collection pupil of the optical inspection system.
    Type: Grant
    Filed: February 26, 2020
    Date of Patent: March 23, 2021
    Assignee: KLA-Tencor Corporation
    Inventors: Robert M. Danen, Dmitri G Starodub
  • Patent number: 10615067
    Abstract: Disclosed are methods and apparatus for facilitating defect detection in a multilayer stack. The method includes selection of a set of structure parameters for modeling a particular multilayer stack and a particular defect contained within such particular multilayer stack and a set of operating parameters for an optical inspection system. Based on the set of structure and operating parameters, an electromagnetic simulation is performed of waves scattered from the particular multilayer stack and defect and arriving at a collection pupil of the optical inspection system.
    Type: Grant
    Filed: August 10, 2018
    Date of Patent: April 7, 2020
    Assignee: KLA-Tencor Corporation
    Inventors: Robert M. Danen, Dmitri G. Starodub
  • Publication number: 20190355601
    Abstract: Disclosed are methods and apparatus for facilitating defect detection in a multilayer stack. The method includes selection of a set of structure parameters for modeling a particular multilayer stack and a particular defect contained within such particular multilayer stack and a set of operating parameters for an optical inspection system. Based on the set of structure and operating parameters, an electromagnetic simulation is performed of waves scattered from the particular multilayer stack and defect and arriving at a collection pupil of the optical inspection system.
    Type: Application
    Filed: August 10, 2018
    Publication date: November 21, 2019
    Applicant: KLA-Tencor Corporation
    Inventors: Robert M. Danen, Dmitri G. Starodub