Abstract: A method of optimizing execution of a control function on a control system including a plurality of hardware components includes: determining a processing capability and a communication capability of each of the plurality of hardware components; generating a plurality of solutions for executing the control function using the plurality of hardware components based on a processing capability and a communication capability of each of the plurality of hardware components; scoring the plurality of generated solutions based on a desirability of each solution; selecting a solution having a highest desirability score; and controlling the control system to execute the control function based on the selected solution.

Abstract: A method of optimizing execution of a control function on a control system including a plurality of hardware components includes: determining a processing capability and a communication capability of each of the plurality of hardware components; generating a plurality of solutions for executing the control function using the plurality of hardware components based on a processing capability and a communication capability of each of the plurality of hardware components; scoring the plurality of generated solutions based on a desirability of each solution; selecting a solution having a highest desirability score; and controlling the control system to execute the control function based on the selected solution.

Abstract: Various embodiments of the present invention relate to particle beam writing to fabricate an integrated circuit on a wafer. In various embodiments, cell projection (CP) cell library information is stored in the form of a data structure. Subsequently, the CP cell library information is referenced by a writing system. The patterns are written on the wafer depending on the referenced CP cell library.

Abstract: Various embodiments of the present invention relate to particle beam writing to fabricate an integrated circuit on a wafer. In various embodiments, cell projection (CP) cell library information is stored in the form of a data structure. Subsequently, the CP cell library information is referenced by a writing system. The patterns are written on the wafer depending on the referenced CP cell library.

Abstract: Various embodiments of the present invention relate to particle beam writing to fabricate an integrated circuit on a wafer. In various embodiments, cell projection (CP) cell library information is stored in the form of a data structure. Subsequently, the CP cell library information is referenced by a writing system. The patterns are written on the wafer depending on the referenced CP cell library.

Abstract: Various embodiments of the present invention are generally directed to a method, system, and computer program product for implementing direct measurement model with simulation and calibration of manufacturing process model in the manufacturing of precision devices such as electronic integrated circuits. The method and the system determine the measured measurement result and the direct measurement information and compare the direct measurement information against the other to determine whether to adjust the process models and the empirical parameters thereof.

Abstract: Various embodiments of the present invention relate to particle beam writing to fabricate an integrated circuit on a wafer. In various embodiments, cell projection (CP) cell library information is stored in the form of a data structure. Subsequently, the CP cell library information is referenced by a writing system. The patterns are written on the wafer depending on the referenced CP cell library.

Abstract: Various embodiments of the present invention relate to particle beam writing to fabricate an integrated circuit on a wafer. In various embodiments, cell projection (CP) cell library information is stored in the form of a data structure. Subsequently, the CP cell library information is referenced by a writing system. The patterns are written on the wafer depending on the referenced CP cell library.

Abstract: A system and method for improved electron beam writing that is capable of taking design intent, equipment capability and design requirements into consideration. The system and method determines an optimal writing pattern based, at least in part, on the received information.

Abstract: Various embodiments of the present invention relate to particle beam writing to fabricate an integrated circuit on a wafer. In various embodiments, cell projection (CP) cell library information is stored in the form of a data structure. Subsequently, the CP cell library information is referenced by a writing system. The patterns are written on the wafer depending on the referenced CP cell library.

Abstract: Various embodiments of the present invention are generally directed to a method, system, and computer program product for implementing direct measurement model with simulation and calibration of manufacturing process model in the manufacturing of precision devices such as electronic integrated circuits. The method and the system determine the measured measurement result and the direct measurement information and compare the direct measurement information against the other to determine whether to adjust the process models and the empirical parameters thereof.

Abstract: A system and method for improved electron beam writing that is capable of taking design intent, equipment capability and design requirements into consideration. The system and method determines an optimal writing pattern based, at least in part, on the received information.