Patents by Inventor Dmitriy Victorovich Lopaev

Dmitriy Victorovich Lopaev has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus
    Patent number: 8317929
    Abstract: A method for cleaning elements of a lithographic apparatus, for example optical elements such as a collector mirror, includes providing a gas containing nitrogen; generating nitrogen radicals from at least part of the gas, thereby forming a radical containing gas; and providing at least part of the radical containing gas to the one or more elements of the apparatus. A lithographic apparatus includes a source and an optical element, and an electrical discharge generator arranged to generate a radio frequency discharge.
    Type: Grant
    Filed: March 6, 2006
    Date of Patent: November 27, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Tatyana Victorovna Rakhimova, Vadim Yevgenyevich Banine, Vladimir Vitalevich Ivanov, Konstantin Nikolaevitch Koshelev, Johannes Hubertus Johannes Moors, Aleksander Sergeevich Kovalev, Dmitriy Victorovich Lopaev
  • Lithographic apparatus and device manufacturing method
    Patent number: 7872244
    Abstract: A source configured to generate radiation for a lithographic apparatus is disclosed. The source includes an anode, and a cathode. The cathode and the anode are configured to create a discharge in a fuel in a discharge space between the anode and the cathode so as to generate a plasma, the cathode and the anode positioned relative to each other so that, in use, current lines extending between the anode and the cathode are substantially curved so as to create a force that substantially radially compresses the plasma only in a region proximate an upper surface of the cathode or of the anode.
    Type: Grant
    Filed: August 8, 2007
    Date of Patent: January 18, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Vladimir Vitalevich Ivanov, Vadim Yevgenyevich Banine, Arno Jan Bleeker, Konstantin Nikolaevich Koshelev, Pavel Stanislavovich Antsiferov, Vladimir Mihailovitch Krivtsun, Dmitriy Victorovich Lopaev
  • Lithographic apparatus and device manufacturing method
    Publication number: 20090040492
    Abstract: A source configured to generate radiation for a lithographic apparatus is disclosed. The source includes an anode, and a cathode. The cathode and the anode are configured to create a discharge in a fuel in a discharge space between the anode and the cathode so as to generate a plasma, the cathode and the anode positioned relative to each other so that, in use, current lines extending between the anode and the cathode are substantially curved so as to create a force that substantially radially compresses the plasma only in a region proximate an upper surface of the cathode or of the anode.
    Type: Application
    Filed: August 8, 2007
    Publication date: February 12, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Vladimir Vitalevich Ivanov, Vadim Yevgenyevich Banine, Arno Jan Bleeker, Konstantin Nikolaevich Koshelev, Pavel Stanislavovich Antsiferov, Vladimir Mihailovitch Krivtsun, Dmitriy Victorovich Lopaev