Abstract: A system that contains a semi-ellipsoidal SLM holder supporting a plurality of flat rectangular SLMs, which are placed onto the semi-ellipsoidal surface of the holder in the most surface-covering way. The system contains a coherent light source placed in the first focal point of the ellipsoid. The second focal point of the ellipsoid defines the area in which an image-receiving object is to be placed. All the SLMs are illuminated by a diverging light beam emitted from the coherent light source. In each SLM, the light is subjected to phase-amplitude modulation and is converted into an image-carrying beam, which convergently fells onto the object on which the target image is to be produced. Thus, a pattern is formed on the object by a maskless method in which a plurality of SLMs are combined into a common image-forming holographic unit.

Abstract: A system for generating a lithographic image contains a light source that emits a diverging light beam and a reflective concave curvilinear surface onto which the diverging light beam falls and which reflects the diverging beam in the form of a converging beam. A digital hologram, which is placed into a diverging beam between the light source and the reflective surface, is coded in accordance with the lithographic image either preliminarily or dynamically, with the use of a spatial light modulator. From the curvilinear surface the spatially modulated beam is reflected in the form of a converging beam which falls onto an image-receiving substrate that is located in the image restoration plane and on which the lithographic image is generated.

Abstract: A system for generating a lithographic image contains a a light source that emits a diverging light beam and a reflective concave curvilinear surface onto which the diverging light beam falls and which reflects the diverging beam in the form of a converging beam. A digital hologram, which is placed into a diverging beam between the light source and the reflective surface, is coded in accordance with the lithographic image either preliminarily or dynamically, with the use of a spatial light modulator. From the curvilinear surface the spatially modulated beam is reflected in the form of a converging beam which falls onto an image-receiving substrate that is located in the image restoration plane and on which the lithographic image is generated.

Abstract: A system for generating a lithographic image contains a alight source that emits a diverging light beam and a reflective concave curvilinear surface onto which the diverging light beam falls and which reflects the diverging beam in the form of a converging beam. A digital hologram, which is coded in accordance with the initial lithographic image either preliminarily or dynamically with the use of a spatial light modulator, is placed into the converging beam between the reflective surface and the image-receiving object. The image of an initial lithographic image formed on the image-receiving object is subsequently used in the processes of microlithography.

Abstract: The invention describes a method of manufacturing a holographic mask capable of producing an image pattern that contains elements of a sub-wavelength size along with decreased deviations from the original pattern. The original pattern is converted into a virtual electromagnetic field and is divided into a set of virtual cells with certain amplitudes and phases, which are mathematically processed for obtaining the virtual digital hologram. The calculation of the latter is based on parameters of the restoration wave, which is used to produce the image pattern from the mask, and on computer optimization by variation of amplitudes and phases of the set of virtual cells and/or parameters of the virtual digital hologram for reaching a satisfactory matching between the produced image pattern and the original pattern. The obtained virtual digital hologram provides physical parameters of the actual digital hologram that is to be manufactured.