Patents by Inventor Dmitry GRISHIN

Dmitry GRISHIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS
    Publication number: 20240087848
    Abstract: Embodiments provided herein generally include apparatus, e.g., plasma processing systems, and methods for the plasma processing of a substrate in a processing chamber. Some embodiments are directed to a waveform generator. The waveform generator generally includes a first voltage stage having: a first voltage source; a first switch; and a second switch, where a first terminal of the first voltage source is coupled to a first terminal of the first switch, and where a second terminal of the first voltage source is coupled to a first terminal of the second switch. The waveform generator also includes a current stage coupled to a common node between second terminals of the first switch and the second switch, the current stage having a current source and a third switch coupled to the current source.
    Type: Application
    Filed: November 13, 2023
    Publication date: March 14, 2024
    Inventors: Fabrice CUBAYNES, Dmitry GRISHIN
  • Pulsed voltage source for plasma processing
    Patent number: 11887813
    Abstract: Embodiments provided herein generally include apparatus, e.g., plasma processing systems, and methods for the plasma processing of a substrate in a processing chamber. Some embodiments are directed to a waveform generator. The waveform generator generally includes a first voltage stage having: a first voltage source; a first switch; and a second switch, where a first terminal of the first voltage source is coupled to a first terminal of the first switch, and where a second terminal of the first voltage source is coupled to a first terminal of the second switch. The waveform generator also includes a current stage coupled to a common node between second terminals of the first switch and the second switch, the current stage having a current source and a third switch coupled to the current source.
    Type: Grant
    Filed: October 6, 2022
    Date of Patent: January 30, 2024
    Assignee: Applied Materials, Inc.
    Inventors: Fabrice Cubaynes, Dmitry Grishin
  • PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS
    Publication number: 20230029754
    Abstract: Embodiments provided herein generally include apparatus, e.g., plasma processing systems, and methods for the plasma processing of a substrate in a processing chamber. Some embodiments are directed to a waveform generator. The waveform generator generally includes a first voltage stage having: a first voltage source; a first switch; and a second switch, where a first terminal of the first voltage source is coupled to a first terminal of the first switch, and where a second terminal of the first voltage source is coupled to a first terminal of the second switch. The waveform generator also includes a current stage coupled to a common node between second terminals of the first switch and the second switch, the current stage having a current source and a third switch coupled to the current source.
    Type: Application
    Filed: October 6, 2022
    Publication date: February 2, 2023
    Inventors: Fabrice CUBAYNES, Dmitry GRISHIN
  • Pulsed voltage source for plasma processing applications
    Patent number: 11569066
    Abstract: Embodiments provided herein generally include apparatus, e.g., plasma processing systems, and methods for the plasma processing of a substrate in a processing chamber. Some embodiments are directed to a waveform generator. The waveform generator generally includes a first voltage stage having: a first voltage source; a first switch; and a second switch, where a first terminal of the first voltage source is coupled to a first terminal of the first switch, and where a second terminal of the first voltage source is coupled to a first terminal of the second switch. The waveform generator also includes a current stage coupled to a common node between second terminals of the first switch and the second switch, the current stage having a current source and a third switch coupled to the current source.
    Type: Grant
    Filed: June 23, 2021
    Date of Patent: January 31, 2023
    Inventors: Fabrice Cubaynes, Dmitry Grishin
  • PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS
    Publication number: 20220415615
    Abstract: Embodiments provided herein generally include apparatus, e.g., plasma processing systems, and methods for the plasma processing of a substrate in a processing chamber. Some embodiments are directed to a waveform generator. The waveform generator generally includes a first voltage stage having: a first voltage source; a first switch; and a second switch, where a first terminal of the first voltage source is coupled to a first terminal of the first switch, and where a second terminal of the first voltage source is coupled to a first terminal of the second switch. The waveform generator also includes a current stage coupled to a common node between second terminals of the first switch and the second switch, the current stage having a current source and a third switch coupled to the current source.
    Type: Application
    Filed: June 23, 2021
    Publication date: December 29, 2022
    Inventors: Fabrice CUBAYNES, Dmitry GRISHIN