Abstract: The invention relates to a method for measuring a photomask for semiconductor lithography, including the following steps: recording an aerial image of at least one region of the photomask, defining at least one region of interest, ascertaining structure edges in at least one region of interest, providing desired structures to be produced by the photomask, adapting the ascertained structure edges to the desired structures, and displacing the adapted structure edges by means of the results of a separate registration measurement.

Abstract: To determine an imaging quality of an optical system when illuminated by illumination light within a pupil to be measured of the optical system and/or to qualify the phase effect of a test structure, a test structure that is periodic in at least one dimension is initially arranged in an object plane of the optical system. An initial illumination angle distribution for illuminating the test structure with an initial pupil region, whose area is less than 10% of a total pupil area, is specified and the test structure is illuminated thereby in different distance positions relative to the object plane. In this way, an initial measured aerial image of the test structure is determined.

Abstract: A system for data communication in a network between two or more local devices and a cloud computing platform, in which data collected and/or stored on at least one local device are transmitted to a cloud computing platform using at least one communication protocol and processed by a translation algorithm executed in a translator module (170) of the cloud computing platform, is provided. The data is transferred to at least one other communication protocol that is processable or executable by at least one second local device and submitted to the at least one second device.

Abstract: The invention relates to a method for measuring a photomask for semiconductor lithography, including the following steps: recording an aerial image of at least one region of the photomask, defining at least one region of interest, ascertaining structure edges in at least one region of interest, providing desired structures to be produced by the photomask, adapting the ascertained structure edges to the desired structures, and displacing the adapted structure edges by means of the results of a separate registration measurement.

Abstract: A computer-implemented method includes identifying a data stream and identifying one or more video classification circumstantial guidelines. The computer-implemented method further includes determining whether the data stream satisfies at least one of the one or more video classification circumstantial guidelines. A corresponding computer program product and computer system are also disclosed.