Patents by Inventor Dmitry Skvortsov

Dmitry Skvortsov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11639892
    Abstract: Systems and methods for skewed basis set fitting may include obtaining measured absorption data indicative of an amount of absorption of light by a sample gas at each of multiple frequencies, determining an absorption dependent cavity time constant indicative of a skew to the measured absorption data caused by light reflections within a cavity in which the sample gas is contained, obtaining reference absorption data including basis sets indicative of reference amounts of light absorbed by each of multiple gases at each of the multiple frequencies, skewing the reference absorption data based on the absorption dependent cavity time constant to generate skewed reference absorption data, and fitting the measured absorption data to the skewed reference absorption data to identify an amount of at least one constituent gas within the sample gas.
    Type: Grant
    Filed: April 2, 2021
    Date of Patent: May 2, 2023
    Assignee: ABB SCHWEIZ AG
    Inventors: J. Brian Leen, Kyle Owen, John Savee, Dmitry Skvortsov, Paul Hansen, Raphael Desbiens
  • Publication number: 20220317029
    Abstract: Systems and methods for skewed basis set fitting may include obtaining measured absorption data indicative of an amount of absorption of light by a sample gas at each of multiple frequencies, determining an absorption dependent cavity time constant indicative of a skew to the measured absorption data caused by light reflections within a cavity in which the sample gas is contained, obtaining reference absorption data including basis sets indicative of reference amounts of light absorbed by each of multiple gases at each of the multiple frequencies, skewing the reference absorption data based on the absorption dependent cavity time constant to generate skewed reference absorption data, and fitting the measured absorption data to the skewed reference absorption data to identify an amount of at least one constituent gas within the sample gas.
    Type: Application
    Filed: April 2, 2021
    Publication date: October 6, 2022
    Inventors: J. Brian Leen, Kyle Owen, John Savee, Dmitry Skvortsov, Paul Hansen, Raphael Desbiens
  • Patent number: 11442021
    Abstract: Heights on a surface of a photomask are measured using broadband light interferometry. The heights include heights of patterned areas of the photomask. A focal map is produced from the measured heights on the surface of the photomask. To produce the focal map, the measured heights of the patterned areas are adjusted based on fill factors for the patterned areas. The photomask is inspected for defects, using the focal map.
    Type: Grant
    Filed: October 5, 2020
    Date of Patent: September 13, 2022
    Assignee: KLA Corporation
    Inventors: Rui-Fang Shi, Dmitry Skvortsov
  • Publication number: 20220196572
    Abstract: A photomask-inspection system includes a vacuum chamber and a stage, disposed in the vacuum chamber, to support a photomask and to translate the photomask horizontally and vertically. The system also includes an EUV objective, disposed in the vacuum chamber, to collect EUV light from the photomask to inspect the photomask for defects and an optical height sensor, at least partially disposed in the vacuum chamber, to measure heights on a surface of the photomask. The system further includes a stage controller to translate the stage horizontally and vertically in accordance with a focal map for the photomask produced using the measured heights on the surface of the photomask.
    Type: Application
    Filed: June 21, 2021
    Publication date: June 23, 2022
    Inventors: Zefram Marks, Dmitry Skvortsov, Zhengyu Guo, Zhengcheng Lin, Nicolas Steven Juliano, Rui-Fang Shi
  • Publication number: 20210109030
    Abstract: Heights on a surface of a photomask are measured using broadband light interferometry. The heights include heights of patterned areas of the photomask. A focal map is produced from the measured heights on the surface of the photomask. To produce the focal map, the measured heights of the patterned areas are adjusted based on fill factors for the patterned areas. The photomask is inspected for defects, using the focal map.
    Type: Application
    Filed: October 5, 2020
    Publication date: April 15, 2021
    Inventors: Rui-Fang Shi, Dmitry Skvortsov
  • Publication number: 20160139200
    Abstract: An apparatus and method for laser probing of a DUT is disclosed. The system enables laser voltage imaging state mapping of devices within the DUT. A selected area of the DUT is illuminating a while the DUT is receiving test signals causing certain of the active devices to modulate. Light reflected from the DUT is collected and is converted into an electrical signal. Phase information is extracting from the electrical signal and a two-dimensional image is generated from the phase information, wherein the two-dimensional image spatially correlates to the selected area.
    Type: Application
    Filed: January 21, 2016
    Publication date: May 19, 2016
    Inventors: Yin Shyang Ng, Dmitry Skvortsov
  • Patent number: 9244121
    Abstract: An apparatus and method for laser probing of a DUT is disclosed. The system enables laser voltage imaging state mapping of devices within the DUT. A selected area of the DUT is illuminating a while the DUT is receiving test signals causing certain of the active devices to modulate. Light reflected from the DUT is collected and is converted into an electrical signal. Phase information is extracting from the electrical signal and a two-dimensional image is generated from the phase information, wherein the two-dimensional image spatially correlates to the selected area.
    Type: Grant
    Filed: June 17, 2014
    Date of Patent: January 26, 2016
    Assignee: DCG SYSTEMS, INC.
    Inventors: Yin Shyang Ng, Dmitry Skvortsov
  • Publication number: 20140292363
    Abstract: An apparatus and method for laser probing of a DUT is disclosed. The system enables laser voltage imaging state mapping of devices within the DUT. A selected area of the DUT is illuminating a while the DUT is receiving test signals causing certain of the active devices to modulate. Light reflected from the DUT is collected and is converted into an electrical signal. Phase information is extracting from the electrical signal and a two-dimensional image is generated from the phase information, wherein the two-dimensional image spatially correlates to the selected area.
    Type: Application
    Filed: June 17, 2014
    Publication date: October 2, 2014
    Inventors: Yin Shyang Ng, Dmitry Skvortsov
  • Patent number: 8754633
    Abstract: An apparatus and method for laser probing of a DUT is disclosed. The system enables laser voltage imaging state mapping of devices within the DUT. A selected area of the DUT is illuminating a while the DUT is receiving test signals causing certain of the active devices to modulate. Light reflected from the DUT is collected and is converted into an electrical signal. Phase information is extracting from the electrical signal and a two-dimensional image is generated from the phase information, wherein the two-dimensional image spatially correlates to the selected area.
    Type: Grant
    Filed: May 3, 2010
    Date of Patent: June 17, 2014
    Assignee: DCG Systems, Inc.
    Inventors: Yin Shyang Ng, Dmitry Skvortsov
  • Publication number: 20100277159
    Abstract: An apparatus and method for laser probing of a DUT is disclosed. The system enables laser voltage imaging state mapping of devices within the DUT. A selected area of the DUT is illuminating a while the DUT is receiving test signals causing certain of the active devices to modulate. Light reflected from the DUT is collected and is converted into an electrical signal. Phase information is extracting from the electrical signal and a two-dimensional image is generated from the phase information, wherein the two-dimensional image spatially correlates to the selected area.
    Type: Application
    Filed: May 3, 2010
    Publication date: November 4, 2010
    Inventors: Yin Shyang NG, Dmitry Skvortsov