Patents by Inventor Dmitry YARMOLICH

Dmitry YARMOLICH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11970400
    Abstract: There is described a carbon material comprising sp2 and sp3 hybridised carbon. Also described is a method of making a carbon material the method comprising: exposing a substrate to a flux of at least 1011 carbon ions per cm2 of substrate per 1 ms, a majority of the carbon ions having a kinetic energy of at least 10 eV. Further, electrodes comprising the carbon material are described. The electrodes may operate as an anode in Li ion battery characterised with improved specific capacity and operation life-time.
    Type: Grant
    Filed: September 23, 2019
    Date of Patent: April 30, 2024
    Assignee: PLASMA APP LTD.
    Inventors: Dmitry Yarmolich, Denis Yarmolich, Ramachandran Vasant Kumar, Rumen Tomov, Hyun-Kyung Kim, Teng Zhao
  • Publication number: 20240018005
    Abstract: There is described a carbon material comprising sp2 and sp3 hybridised carbon. Also described is a method of making a carbon material the method comprising: exposing a substrate to a flux of at least 1011 carbon ions per cm2 of substrate per 1 ms, a majority of the carbon ions having a kinetic energy of at least 10 eV. Further, electrodes comprising the carbon material are described. The electrodes may operate as an anode in Li ion battery characterised with improved specific capacity and operation life-time.
    Type: Application
    Filed: July 18, 2023
    Publication date: January 18, 2024
    Inventors: Dmitry YARMOLICH, Denis YARMOLICH, Ramachandran Vasant KUMAR, Rumen TOMOV, Hyun-Kyung KIM, Teng ZHAO
  • Publication number: 20200095129
    Abstract: There is described a carbon material comprising sp2 and sp3 hybridised carbon. Also described is a method of making a carbon material the method comprising: exposing a substrate to a flux of at least 1011 carbon ions per cm2 of substrate per 1 ms, a majority of the carbon ions having a kinetic energy of at least 10 eV. Further, electrodes comprising the carbon material are described. The electrodes may operate as an anode in Li ion battery characterised with improved specific capacity and operation life-time.
    Type: Application
    Filed: September 23, 2019
    Publication date: March 26, 2020
    Inventors: Dmitry YARMOLICH, Denis YARMOLICH, Ramachandran Vasant KUMAR, Rumen TOMOV, Hyun-Kyung KIM, Teng ZHAO
  • Patent number: 10047432
    Abstract: A virtual cathode deposition apparatus utilises virtual plasma cathode for generation of high density electron beam to ablate a solid target. A high voltage electrical pulse ionizes gas to produce a plasma which temporarily appears in front of the target and serves as the virtual plasma cathode at the vicinity of target. This plasma then disappears allowing the ablated target material in a form of a plasma plume to propagate toward the substrate. Several virtual cathodes operating in parallel provide plumes that merge into a uniform plasma which when condensing on a nearby substrate leads to wide area deposition of a uniform thickness thin film.
    Type: Grant
    Filed: September 18, 2015
    Date of Patent: August 14, 2018
    Assignee: PLASMA APP LTD.
    Inventor: Dmitry Yarmolich
  • Publication number: 20170247789
    Abstract: A virtual cathode deposition apparatus utilises virtual plasma cathode for generation of high density electron beam to ablate a solid target. A high voltage electrical pulse ionizes gas to produce a plasma which temporarily appears in front of the target and serves as the virtual plasma cathode at the vicinity of target. This plasma then disappears allowing the ablated target material in a form of a plasma plume to propagate toward the substrate. Several virtual cathodes operating in parallel provide plumes that merge into a uniform plasma which when condensing on a nearby substrate leads to wide area deposition of a uniform thickness thin film.
    Type: Application
    Filed: September 18, 2015
    Publication date: August 31, 2017
    Inventor: Dmitry YARMOLICH
  • Publication number: 20150345021
    Abstract: A pulsed plasma deposition device, including an apparatus for generating a beam of electrons, a target and a substrate, the apparatus being suitable for generating a pulsed beam of electrons directed towards said target to determine the ablation of the material of said target in the form of a plasma plume directed towards said substrate. The device includes a transportation and focussing group of the beam of electrons towards said target, arranged between said apparatus and said target and including a transportation cone, the transportation and focussing group also including a focussing electrode directly connected to the transportation cone and shaped substantially like a loop. The axis of symmetry of the focussing electrode is perpendicular, or substantially perpendicular, to the surface of the target.
    Type: Application
    Filed: December 20, 2013
    Publication date: December 3, 2015
    Inventors: Dmitry YARMOLICH, Carlo Taliani