Abstract: A method for photonic sampling of a test-waveform is provided. The method includes providing a sampling light pulse and generating a local oscillator by frequency multiplication of the sampling light pulse. The method further includes generating a signal wave by frequency mixing of the sampling light pulse and the test-waveform in a nonlinear optical element, wherein the frequency multiplication of the sampling light pulse and the frequency mixing of the sampling light pulse and the test-waveform are selected such that the local oscillator and the signal wave are at least partly spectrally overlapping. Moreover, the method includes detecting an interference signal of the local oscillator and the signal wave for various time delays of the sampling light pulse with respect to the test-waveform. A device for sampling a test-waveform is also disclosed.

Abstract: An inline vacuum processing apparatus for processing of substrates in vacuum comprises at least one load-lock chamber, at least two subsequent deposition chambers to be operated with essentially the same set of coating parameters and at least one unload-lock chamber plus means for transferring, post-processing and/or handling substrates through and in the various chambers. A method for depositing a thin film on a substrate in such processing system comprises the steps of introducing a first substrate into a load-lock chamber, lowering the pressure in said chamber; transferring the substrate into a first deposition chamber; depositing a layer of a first material on said first substrate using a first set of coating parameters; transferring said first substrate into a second, subsequent deposition chamber of said inline system without breaking vacuum and depositing a further layer of said first material on said first substrate using substantially the same set of parameters.