Abstract: An apparatus for dispensing multiple precursors to a manufacturing tool includes a fluidic manifold having a plurality of interconnected sub-manifolds, a plurality of tanks, each tank containing a different precursor, and wherein each of the sub-manifolds is connected to one of the tanks. A system for dispensing multiple precursors to a manufacturing tool includes a multiple precursor dispenser having a fluidic manifold and a plurality of tanks, each tank containing a different precursor and connected to a different sub-manifold of the fluidic manifold, the sub-manifolds being interconnected, a manufacturing tool fluidic processor having a plurality of canisters, each canister containing a different precursor, wherein a first dispenser tank communicates with a first tool canister having the same precursor, and wherein a second dispenser tank communicates with a second tool canister having the same precursor. Related methods are also described herein.

Abstract: Complex fluidic micro electromechanical systems (MEMS) are incorporated into high purity chemical delivery systems, while maintaining valve sealing integrity, quality and performance of the system. In particular, fluidic MEMS systems are incorporated into high purity chemical delivery systems for semiconductor fabrication processes.

Abstract: Complex fluidic micro electromechanical systems (MEMS) are incorporated into high purity chemical delivery systems, while maintaining valve sealing integrity, quality and performance of the system. In particular, fluidic MEMS systems are incorporated into high purity chemical delivery systems for semiconductor fabrication processes.

Abstract: Complex fluidic micro electromechanical systems (MEMS) are incorporated into high purity chemical delivery systems, while maintaining valve sealing integrity, quality and performance of the system. In particular, fluidic MEMS systems are incorporated into high purity chemical delivery systems for semiconductor fabrication processes.

Abstract: Provided are novel methods of preventing deposition on an optical component in an absorption spectroscopy measurement cell. The methods involve performing an absorption spectroscopy measurement of a sample gas introduced into the cell, and introducing a flow of purge gas from a purge gas inlet pipe across a critical surface of the optical element at a velocity effective to prevent deposition on the critical surface. The gas inlet is disposed adjacent said critical surface. Also provided are devices for practicing the inventive method, measurement cells useful in absorption spectroscopy measurements, apparatuses for performing an absorption spectroscopy measurement and semiconductor processing apparatuses. The invention allows for the performance of accurate spectroscopic measurements. Because deposits are prevented from forming on the surface of an optical element, interference therefrom can effectively be avoided.

Abstract: Provided is a novel method for rapidly determining an impurity level in a gas source. A gas source and a measurement tool are provided for measuring an impurity level in a gas flowing from the gas source. The measurement tool is in communication with the gas source through a sampling line. The sampling line has a gas inlet disposed upstream from a gas outlet. The sampling line is baked according to a baking strategy, such that when baking is terminated, a concentration profile of the impurity in the sampling line contains a first region and a second region. In the first region, extending from the gas inlet to a point downstream from the inlet, the vapor phase concentration of the impurity is less than the vapor phase concentration of the impurity in the gas entering the sampling line.