Patents by Inventor Do Hyuk IM

Do Hyuk IM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230096077
    Abstract: A photosensitive resin composition including a silsesquioxane-based copolymer obtained by copolymerizing a first monomer represented by Chemical Formula 1 (R1—R2—Si (R3)3), a second monomer represented by Chemical Formula 2 ((R4)n—Si(R5)4-n), a third monomer represented by Chemical Formula 3 (Si(R6)4), and a fourth monomer represented by Chemical Formula 4 ((R7)3—Si—R8—Si—(R7)3) are provided.
    Type: Application
    Filed: July 18, 2022
    Publication date: March 30, 2023
    Inventors: Jun Young KIM, GWUI-HYUN PARK, KOICHI SUGITANI, HYE IN KIM, Do Hyuk IM, SAEHEE HAN, PIL SOON HONG, Hwa Young KIM, Do Hyun SEO, Ho Sung CHOI, Sung Goo HAN