Abstract: A plasma processing apparatus effectively generates plasma in a large area by applying an external magnetic field generated by an electromagnet to the plasma in a direction which is not in parallel with a wall of a plasma container, such that the magnetic field diverge or converge in the vicinity of a work piece (for example, a wafer). The plasma processing apparatus includes a power supply to generate a high frequency power, an antenna to receive the high frequency power and to generate an electromagnetic field, a chamber to generate the plasma using power generated through the electromagnetic field, and a coil provided on a side wall of the chamber to disrupt a uniformity of the electromagnetic field within the chamber.