Patents by Inventor Do Young Ha

Do Young Ha has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12173092
    Abstract: The present technology provides a carboxylic acid-modified nitrile-based copolymer latex including a carboxylic acid-modified nitrile-based copolymer including a conjugated diene-based monomer-derived unit, an ethylenic unsaturated nitrile-based monomer-derived unit, and an ethylenic unsaturated acid monomer-derived unit, wherein a pKa is 9.5 to 10.2, and the carboxylic acid-modified nitrile-based copolymer latex satisfies General Formulas 1 and 2.
    Type: Grant
    Filed: February 8, 2021
    Date of Patent: December 24, 2024
    Assignee: LG Chem, Ltd.
    Inventors: Jung Eun Kim, Won Sang Kwon, Ji Hyun Kim, Sang Jin Shin, Do Young Ha
  • Patent number: 12157817
    Abstract: The present technology provides a carboxylic acid-modified nitrile-based copolymer latex including a carboxylic acid-modified nitrile-based copolymer including a conjugated diene-based monomer-derived unit, an ethylenic unsaturated nitrile-based monomer-derived unit, and an ethylenic unsaturated acid monomer-derived unit, wherein the carboxylic acid-modified nitrile-based copolymer latex satisfies General Formulas 1 and General Formula 2.
    Type: Grant
    Filed: February 8, 2021
    Date of Patent: December 3, 2024
    Assignee: LG Chem, Ltd.
    Inventors: Jung Su Han, Won Sang Kwon, Jung Eun Kim, Seung Uk Yeu, Do Young Ha
  • Patent number: 12157816
    Abstract: The present technology relates to a latex composition for dip molding comprising a carboxylic acid-modified nitrile-based copolymer latex satisfying General Formulas 1 and 2, wherein the carboxylic acid-modified nitrile-based copolymer includes a conjugated diene-based monomer-derived unit, an ethylenic unsaturated nitrile-based monomer-derived unit, and an ethylenic unsaturated acid monomer-derived unit, and a molded article.
    Type: Grant
    Filed: February 8, 2021
    Date of Patent: December 3, 2024
    Assignee: LG Chem, Ltd.
    Inventors: Seung Whan Oh, Won Sang Kwon, Jung Eun Kim, Ji Hyun Kim, Seung Uk Yeu, Myung Su Jang, Do Young Ha, Jung Su Han
  • Patent number: 11873391
    Abstract: Disclosed is a latex composition for dip molding including a carboxylic acid-modified nitrile-based copolymer latex satisfying General Formula 1, wherein the carboxylic acid-modified nitrile-based copolymer includes: 15 wt % to 30 wt % of the ethylenic unsaturated nitrile-based monomer-derived unit and 2.5 wt % to 4.5 wt % of the ethylenic unsaturated acid monomer-derived unit, and a molded article: 1.0 mm2/s?CV0?3.0 mm2/s.
    Type: Grant
    Filed: February 8, 2021
    Date of Patent: January 16, 2024
    Assignee: LG CHEM, LTD.
    Inventors: Do Young Ha, Won Sang Kwon, Jung Eun Kim, Jung Su Han
  • Patent number: 11667773
    Abstract: A latex composition for dip molding having an excellent flow mark property and syneresis property and being capable of providing a molded article having excellent tensile properties and texture is provided. A method of preparing the latex composition, and a dip-molded article produced using the latex composition are also provided.
    Type: Grant
    Filed: August 21, 2020
    Date of Patent: June 6, 2023
    Inventors: Do Young Ha, Won Sang Kwon, Seung Uk Yeu, Jung Su Han
  • Publication number: 20220227900
    Abstract: The present technology provides a carboxylic acid-modified nitrile-based copolymer latex including a carboxylic acid-modified nitrile-based copolymer including a conjugated diene-based monomer-derived unit, an ethylenic unsaturated nitrile-based monomer-derived unit, and an ethylenic unsaturated acid monomer-derived unit, wherein a pKa is 9.5 to 10.2, and the carboxylic acid-modified nitrile-based copolymer latex satisfies General Formulas 1 and 2.
    Type: Application
    Filed: February 8, 2021
    Publication date: July 21, 2022
    Applicant: LG Chem, Ltd.
    Inventors: Jung Eun Kim, Won Sang Kwon, Ji Hyun Kim, Sang Jin Shin, Do Young Ha
  • Publication number: 20220204732
    Abstract: Disclosed is a latex composition for dip molding including a carboxylic acid-modified nitrile-based copolymer latex satisfying General Formula 1, wherein the carboxylic acid-modified nitrile-based copolymer includes: 15 wt % to 30 wt % of the ethylenic unsaturated nitrile-based monomer-derived unit and 2.5 wt % to 4.5 wt % of the ethylenic unsaturated acid monomer-derived unit, and a molded article: 1.0 mm2/s?CV0?3.0 mm2/s.
    Type: Application
    Filed: February 8, 2021
    Publication date: June 30, 2022
    Applicant: LG CHEM, LTD.
    Inventors: Do Young HA, Won Sang KWON, Jung Eun KIM, Jung Su HAN
  • Publication number: 20220195151
    Abstract: The present technology provides a carboxylic acid-modified nitrile-based copolymer latex including a carboxylic acid-modified nitrile-based copolymer including a conjugated diene-based monomer-derived unit, an ethylenic unsaturated nitrile-based monomer-derived unit, and an ethylenic unsaturated acid monomer-derived unit, wherein the carboxylic acid-modified nitrile-based copolymer latex satisfies General Formula 1 and General Formula 2.
    Type: Application
    Filed: February 8, 2021
    Publication date: June 23, 2022
    Applicant: LG Chem, Ltd.
    Inventors: Jung Su Han, Won Sang Kwon, Jung Eun Kim, Seung Uk Yeu, Do Young Ha
  • Publication number: 20220185999
    Abstract: The present technology relates to a latex composition for dip molding comprising a carboxylic acid-modified nitrile-based copolymer latex satisfying General Formulas 1 and 2, wherein the carboxylic acid-modified nitrile-based copolymer includes a conjugated diene-based monomer-derived unit, an ethylenic unsaturated nitrile-based monomer-derived unit, and an ethylenic unsaturated acid monomer-derived unit, and a molded article.
    Type: Application
    Filed: February 8, 2021
    Publication date: June 16, 2022
    Applicant: LG Chem, Ltd.
    Inventors: Seung Whan Oh, Won Sang Kwon, Jung Eun Kim, Ji Hyun Kim, Seung Uk Yeu, Myung Su Jang, Do Young Ha, Jung Su Han
  • Publication number: 20220017728
    Abstract: A latex composition for dip molding having an excellent flow mark property and syneresis property and being capable of providing a molded article having excellent tensile properties and texture is provided. A method of preparing the latex composition, and a dip-molded article produced using the latex composition are also provided.
    Type: Application
    Filed: August 21, 2020
    Publication date: January 20, 2022
    Applicant: LG Chem, Ltd.
    Inventors: Do Young Ha, Won Sang Kwon, Seung Uk Yeu, Jung Su Han
  • Patent number: 8238937
    Abstract: A location sensing system and method for a mobile communication system is provided for maintaining location sensing service with the support of mobile nodes when there is an insufficient number of anchor nodes for reference points. A location sensing method for a mobile communication system includes discovering, at a source mobile node, anchor nodes in a vicinity; discovering, when a number of discovered anchor nodes is less than a predetermined number of reference nodes required for location sensing, neighboring mobile nodes; selecting at least one of neighboring mobile nodes as a reference mobile node; and computing a location of the source mobile node in cooperation with the predetermined number of reference nodes including the discovered anchor nodes and the reference mobile node.
    Type: Grant
    Filed: January 29, 2009
    Date of Patent: August 7, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Do Young Ha, Joon Oo Kim, Yun Je Oh, Joong Soo Ma, Myoung Hwan Seo, Sung Chang Choi, Myoung In Ji
  • Patent number: 8049618
    Abstract: An indoor location system having a sensor and a method for checking an indoor location using the indoor location system are disclosed. The method includes: calculating a current location coordinate by using nodes; calculating a first movement distance by comparing the current location coordinate and a stored previous location coordinate; calculating a second movement distance through a sensor; and storing the current location coordinate instead of the previous location coordinate when the distance between the first movement distance and the second movement distance is smaller than a predetermined threshold value. Accordingly, an accurate location of an object can be recognized indoors and an error can be prevented from being caused when the location of the object is recognized.
    Type: Grant
    Filed: November 10, 2008
    Date of Patent: November 1, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sung Kweon Park, Won Suk Yang, Yun Je Oh, Joon Oo Kim, Jeong Rok Park, Sang Mook Lee, Jin Serk Baik, Do Young Ha
  • Publication number: 20090209268
    Abstract: A location sensing system and method for a mobile communication system is provided for maintaining location sensing service with the support of mobile nodes when there is an insufficient number of anchor nodes for reference points. A location sensing method for a mobile communication system includes discovering, at a source mobile node, anchor nodes in a vicinity; discovering, when a number of discovered anchor nodes is less than a predetermined number of reference nodes required for location sensing, neighboring mobile nodes; selecting at least one of neighboring mobile nodes as a reference mobile node; and computing a location of the source mobile node in cooperation with the predetermined number of reference nodes including the discovered anchor nodes and the reference mobile node.
    Type: Application
    Filed: January 29, 2009
    Publication date: August 20, 2009
    Inventors: Do Young HA, Joon Oo Kim, Yun Je Oh, Joong Soo Ma, Myoung Hwan Seo, Sung Chang Choi, Myoung In Ji
  • Publication number: 20090121867
    Abstract: An indoor location system having a sensor and a method for checking an indoor location using the indoor location system are disclosed. The method includes: calculating a current location coordinate by using nodes; calculating a first movement distance by comparing the current location coordinate and a stored previous location coordinate; calculating a second movement distance through a sensor; and storing the current location coordinate instead of the previous location coordinate when the distance between the first movement distance and the second movement distance is smaller than a predetermined threshold value. Accordingly, an accurate location of an object can be recognized indoors and an error can be prevented from being caused when the location of the object is recognized.
    Type: Application
    Filed: November 10, 2008
    Publication date: May 14, 2009
    Inventors: Sung Kweon PARK, Won Suk Yang, Yun Je Oh, Joon Oo Kim, Jeong Rok Park, Sang Mook Lee, Jin Serk Baik, Do Young Ha