Patents by Inventor Dodd C. Defibaugh

Dodd C. Defibaugh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Adjustable transmission phase shift mask
    Patent number: 7067223
    Abstract: A phase shift mask having transmission properties that are dependent at least in part on an intensity of an incident light beam. The phase shift mask has a mask substrate that is substantially transparent to the incident light beam. A first phase shift layer is disposed on the mask substrate. The first phase shift layer has a refractive index that is nonlinear with the intensity of the incident light beam. The refractive index of the first phase shift layer changes with the intensity of the incident light beam on the phase shift mask. By using a first phase shift layer on the phase shift mask that has a refractive index that is non linear with the intensity of the incident light beam, properties of a light beam transmitted through the first phase shift layer, such as interference patterns in the transmitted light beam, can be adjusted by adjusting the intensity of the incident light beam.
    Type: Grant
    Filed: October 25, 2004
    Date of Patent: June 27, 2006
    Assignee: LSI Logic Corporation
    Inventors: Kunal N. Taravade, Dodd C. Defibaugh
  • Adjustable transmission phase shift mask
    Patent number: 6841308
    Abstract: A phase shift mask having transmission properties that are dependent at least in part on an intensity of an incident light beam. The phase shift mask has a mask substrate that is substantially transparent to the incident light beam. A first phase shift layer is disposed on the mask substrate. The first phase shift layer has a refractive index that is nonlinear with the intensity of the incident light beam. The refractive index of the first phase shift layer changes with the intensity of the incident light beam on the phase shift mask. By using a first phase shift layer on the phase shift mask that has a refractive index that is non linear with the intensity of the incident light beam, properties of a light beam transmitted through the first phase shift layer, such as interference patterns in the transmitted light beam, can be adjusted by adjusting the intensity of the incident light beam.
    Type: Grant
    Filed: November 9, 2001
    Date of Patent: January 11, 2005
    Assignee: LSI Logic Corporation
    Inventors: Kunal N. Taravade, Dodd C. Defibaugh
  • Anti-corrosion system
    Patent number: 6506684
    Abstract: A method for etching a surface of an integrated circuit. A layer of photoresist is applied to the surface of the integrated circuit. The layer of photoresist is exposed and developed, and the surface of the integrated circuit is etched with an etchant that contains chlorine. The surface of the integrated circuit is exposed to tetra methyl ammonium hydroxide to neutralize the chlorine, and rinsed with water.
    Type: Grant
    Filed: May 24, 2000
    Date of Patent: January 14, 2003
    Assignee: LSI Logic Corporation
    Inventors: David W. Daniel, Dodd C. Defibaugh