Abstract: A lithographic projection apparatus comprises an illumination system for supplying a projection beam of radiation, a mask table provided with a mask holder for holding a mask, a substrate table provided with a substrate holder for holding a substrate, and a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate. The lithographic projection apparatus further comprises a mask-handling apparatus to exchange a mask between a load-port module for receiving masks and the mask holder, the mask-handling apparatus having first and second robots for carrying out the exchange. The first robot exchanges a mask between the load-port module and the second robot, and the second robot exchanges a mask between the first robot and the mask holder. Further, the first robot may also transfer a mask to an internal mask library and a mask inspection module.