Abstract: A display device comprises a first pixel including a first emission area, a second pixel including a second emission area spaced apart from the first emission area in a first direction, and a bank partitioning the first emission area and the second emission area, wherein the first pixel includes a first alignment electrode, a second alignment electrode, and a third alignment electrode sequentially located, spaced apart from each other in the first direction, and overlapping with the first emission area, first light-emitting elements above, and overlapping with, the first alignment electrode and the second alignment electrode, second light-emitting elements above, and overlapping with, the second alignment electrode and the third alignment electrode, and a dummy electrode between the first emission area and the second emission area, and overlapping with the bank.

Abstract: A liquid supply unit includes a tank having an inner space for storing the liquid, an inlet line for supplying the liquid from the liquid supply source to the inner space and having an inlet valve installed thereon, an outlet line for supplying the liquid from the tank to a nozzle or for recollecting the liquid to the tank and having an outlet valve installed thereon, a gas supply line for supplying a gas to the inner space and having a gas control valve installed thereon, an exhaust line for exhausting the inner space and having an exhaust valve installed thereon, a circulation line for circulating the liquid stored in the inner space, and a controller controlling the liquid supply unit so that the circulation line is pressurized while the liquid is supplied to the inner space.

Abstract: Disclosed is a method for treating a substrate in a plurality of chambers. The substrate treating method may include performing liquid treatment on a substrate located in a chamber through a supply line for connecting a circulation line and each of the plurality of chambers while the liquid circulates in the circulation line, wherein a flow rate per unit time of the liquid flowing downstream of a valve provided in the supply line is constantly maintained at a reference flow rate, and controlling an upstream flow rate which is a flow rate per unit time of the liquid flowing upstream of the circulation line rather than the supply lines or a downstream flow rate which is a flow rate per unit time of the liquid flowing downstream of the circulation line rather than the supply lines based on a distribution flow rate which is a flow rate per unit time of the liquid flowing upstream of the valve to maintain the reference flow rate.

Abstract: Provided is an apparatus for supplying a chemical liquid, the apparatus including: a storage tank in which a chemical liquid is stored; a discharge line through which the chemical liquid stored in the storage tank is discharged; a level tube connected to the storage tank so as to check a water level of the chemical liquid in the storage tank and receiving the chemical liquid at the same water level as the water level of the chemical liquid in the storage tank; and a controller for controlling a first valve installed in the discharge line, in which the level tube has one end connected to an upper space of the storage tank and the other end connected to the discharge line.

Abstract: An apparatus for processing a substrate includes a mixing nozzle having a mixing space that is shaped as an inverted cone, the mixing nozzle including a first inlet, a second inlet and an outlet installed at the mixing space; a first chemical supply unit connected to the first inlet; a second chemical supply unit connected to the second inlet; and a supply tank connected to the outlet, wherein the first chemical supply unit is configured to supply a first chemical solution to the mixing space through the first inlet, the second chemical supply unit is configured to supply a second chemical solution to the mixing space through the second inlet, and the supply tank is supplied with, through the outlet, a solution mixture that is formed of the first chemical solution and the second chemical solution after being mixed in the mixing space.

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a support unit configured to support a substrate; and a liquid supply unit configured to supply a treating liquid onto the substrate supported on the support unit, and wherein the liquid supply unit comprises: a tank configured to have an accommodation space for storing the treating liquid therein; a circulation line configured to circulate the treating liquid stored in the accommodation space; a supplementary line configured to supply the treating liquid to the accommodation space, and at which a valve is installed; a heater installed at the circulation line, and for heating the treating liquid; and a controller is configured to control the valve and the heater.

Abstract: The inventive concept provides a liquid storage unit. The liquid storage unit includes a tank housing defining a storing space therein; a liquid outlet pipe penetrating into the tank housing and having an outlet formed thereon; and a liquid inlet pipe penetrating into the tank housing and having an inlet formed thereon, and wherein a first guide surface is provided between the outlet and the inlet.

Abstract: Provided are a treating liquid providing unit capable of predicting a temperature change of a substrate treating liquid by adding an inflow amount or consumption amount of the substrate treating liquid as a control factor, and a substrate treating apparatus including the same. The treating liquid providing unit includes a treating liquid storage module for storing the substrate treating liquid, a treating liquid heating module for heating the substrate treating liquid, a treating liquid discharging module for discharging the substrate treating liquid, a treating liquid supplying module for supplying the substrate treating liquid to the treating liquid storage module when the substrate treating liquid is discharged, and a control module for predicting the temperature of the substrate treating liquid remaining in the treating liquid storage module based on the inflow amount of the substrate treating liquid.

Abstract: A liquid supply unit includes a tank having an inner space for storing the liquid, an inlet line for supplying the liquid from the liquid supply source to the inner space and having an inlet valve installed thereon, an outlet line for supplying the liquid from the tank to a nozzle or for recollecting the liquid to the tank and having an outlet valve installed thereon, a gas supply line for supplying a gas to the inner space and having a gas control valve installed thereon, an exhaust line for exhausting the inner space and having an exhaust valve installed thereon, a circulation line for circulating the liquid stored in the inner space, and a controller controlling the liquid supply unit so that the circulation line is pressurized while the liquid is supplied to the inner space.

Abstract: A substrate processing apparatus a processing liquid supply unit includes a nozzle supplying a processing liquid onto the substrate, a supply line connected to the nozzle to supply the processing liquid to the nozzle, and a cooler cooling the processing liquid. A volume of the processing liquid is reduced by the cooler so that the processing liquid may be sucked.