Patents by Inventor Doheung KIM

Doheung KIM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • POLYMER FILM USING CHEMICAL VAPOR DEPOSITION USING SULFUR AS INITIATOR (SCVD), METHOD OF PREPARING THE SAME AND APPARATUS FOR PREPARING THE SAME
    Publication number: 20220305524
    Abstract: The present invention relates to a method of preparing a polymer film using chemical vapor deposition using sulfur as an initiator (sCVD) capable of manufacturing a polymer film through polymerization of sulfur and a monomer using gas-phase sulfur as an initiator. In the manufactured polymer film, any of various monomers and sulfur can be polymerized into a copolymer, and it is possible to manufacture a polymer film having a high content of sulfur, an excellent refractive index, and excellent transmittance.
    Type: Application
    Filed: September 15, 2020
    Publication date: September 29, 2022
    Inventors: Sung Gap IM, Doheung KIM, Wontae JANG, Keonwoo CHOI