Abstract: The polycarbonate copolymer of the present invention comprises: a unit derived from at least one type of primary dihydroxyl compound; and a unit derived from at least two types of secondary dihydroxyl compounds, wherein the polycarbonate copolymer has a pencil hardness of H or greater, when a specimen is measured according to the pencil hardness test (ISO 15184), and a glass transition temperature (Tg) of about 90° C. to about 160° C., measured according to ISO 11357. The polycarbonate copolymer has excellent heat resistance, scratch resistance, moldability, light resistance, weather resistance, transparency, mechanical strength, and the like.

Abstract: The polycarbonate copolymer of the present invention comprises: a unit derived from at least one type of primary dihydroxyl compound; and a unit derived from at least two types of secondary dihydroxyl compounds, wherein the polycarbonate copolymer has a pencil hardness of H or greater, when a specimen is measured according to the pencil hardness test (ISO 15184), and a glass transition temperature (Tg) of about 90° C. to about 160° C., measured according to ISO 11357. The polycarbonate copolymer has excellent heat resistance, scratch resistance, moldability, light resistance, weather resistance, transparency, mechanical strength, and the like.

Abstract: The present disclosure relates to a method of preparing a polyamide by copolymerization of multiple components, a polyamide prepared thereby, and a composition including the same. The copolymerized polyamide according to an embodiment of the present invention and a composition including the same may exhibit excellent mechanical properties, low temperature properties, and gas barrier properties.

Abstract: A photosensitive resin composition including a silsesquioxane-based copolymer obtained by copolymerizing a first monomer represented by Chemical Formula 1 (R1—R2—Si (R3)3), a second monomer represented by Chemical Formula 2 ((R4)n—Si(R5)4-n), a third monomer represented by Chemical Formula 3 (Si(R6)4), and a fourth monomer represented by Chemical Formula 4 ((R7)3—Si—R8—Si—(R7)3) are provided.

Abstract: The present invention relates to an apparatus and a process for preparing a polyamide. Specifically, the present invention relates to an apparatus and a process for preparing a polyamide that enhances the degree of fixation of a diamine during the polycondensation of a diamine and a dicarboxylic acid. The apparatus and process for preparing a polyamide according to an embodiment of the present invention are capable of enhancing the degree of fixation of a diamine during the polycondensation reaction of a diamine and a dicarboxylic acid.

Abstract: Provided are an apparatus and method of sensing liquid leakage for a lithography apparatus, which can prevent a collector mirror from being contaminated by sensing leakage of cooling water supplied to the collector mirror of an extreme ultraviolet (EUV) light generating apparatus. The liquid leakage sensing apparatus includes a collector mirror module, a cooling unit configured to supply a cooling water to one surface of the collector mirror module, a gas supply unit configured to supply a water soluble gas to the cooling unit, and a sensing unit configured to sense the water soluble gas having leaked to the outside of the cooling unit.

Abstract: An apparatus for generating extreme ultraviolet light includes a droplet generator which provides a droplet to react with light from a light source to generate extreme ultraviolet light, a droplet collector which collects the droplet, and a droplet detector which includes a plurality of pressure sensors, the pressure sensors detect a position of the droplet provided to the droplet collecting unit.

Abstract: An apparatus for generating extreme ultraviolet light includes a droplet generator which provides a droplet to react with light from a light source to generate extreme ultraviolet light, a droplet collector which collects the droplet, and a droplet detector which includes a plurality of pressure sensors, the pressure sensors detect a position of the droplet provided to the droplet collecting unit.

Abstract: Provided are an apparatus and method of sensing liquid leakage for a lithography apparatus, which can prevent a collector mirror from being contaminated by sensing leakage of cooling water supplied to the collector mirror of an extreme ultraviolet (EUV) light generating apparatus. The liquid leakage sensing apparatus includes a collector mirror module, a cooling unit configured to supply a cooling water to one surface of the collector mirror module, a gas supply unit configured to supply a water soluble gas to the cooling unit, and a sensing unit configured to sense the water soluble gas having leaked to the outside of the cooling unit.