Patents by Inventor Dolores Carlotta Miller

Dolores Carlotta Miller has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6509134
    Abstract: Novel norbornene fluoroacrylate copolymers are provided. The polymers are useful in lithographic photoresist compositions, particularly chemical amplification resists. In a preferred embodiment, the polymers are substantially transparent to deep ultraviolet (DUV) radiation, i.e., radiation of a wavelength less than 250 nm, including 157 nm, 193 nm and 248 nm radiation, and are thus useful in DUV lithographic photoresist compositions. A process for using the composition to generate resist images on a substrate is also provided, i.e., in the manufacture of integrated circuits or the like.
    Type: Grant
    Filed: January 26, 2001
    Date of Patent: January 21, 2003
    Assignee: International Business Machines Corporation
    Inventors: Hiroshi Ito, Dolores Carlotta Miller, Phillip Joe Brock, Gregory Michael Wallraff
  • Publication number: 20020146638
    Abstract: Novel norbornene fluoroacrylate copolymers are provided. The polymers are useful in lithographic photoresist compositions, particularly chemical amplification resists. In a preferred embodiment, the polymers are substantially transparent to deep ultraviolet (DUV) radiation, i.e., radiation of a wavelength less than 250 nm, including 157 nm, 193 nm and 248 nm radiation, and are thus useful in DUV lithographic photoresist compositions. A process for using the composition to generate resist images on a substrate is also provided, i.e., in the manufacture of integrated circuits or the like.
    Type: Application
    Filed: January 26, 2001
    Publication date: October 10, 2002
    Inventors: Hiroshi Ito, Dolores Carlotta Miller, Phillip Joe Brock, Gregory Michael Wallraff