Abstract: A cathode sputtering target is formed, on the one hand, from an oxide of at least one element chosen from the group of titanium, silicon and zirconium and, on the other hand, of particles of a metal included in the group formed by silver, gold, platinum, copper and nickel or particles of an alloy formed from at least two of these metals, the atomic ratio M/Me in the target being less than 1.5, M representing all of the atoms of the elements of the group of titanium, silicon and zirconium present in the layer and Me representing all of the atoms of the metals of the group formed by silver, gold, platinum, copper and nickel present in the layer.

Abstract: An abrasive article including a body including abrasive particles contained within a bond material, a first major surface, a second major surface, and a side surface extending between the first major surface and second major surface, and a coating overlying at least a portion of one of the first major surface or the second major surface. In an embodiment, the coating comprises at least one element selected from the group of chromium, nickel, carbon, nitrogen, tungsten, sulfur, molybdenum, iron, zinc, silicon, titanium, aluminum, zirconium, magnesium, zinc, boron, cobalt, calcium, or any combination thereof. In another embodiment, the coating comprises a cermet, a ceramic, or a combination thereof.

Abstract: A transparent substrate is provided on a main face with a stack of thin layers including a single metallic functional layer having properties of reflection in the infrared region and/or in the solar radiation region, in particular based on silver or on silver-containing metal alloy, and two antireflective coatings. The antireflective coatings each include at least one dielectric layer. The functional layer is positioned between the two antireflective coatings. At least the antireflective coating located between the substrate and the functional layer, indeed even both antireflective coatings, include(s) a layer including silicon-zirconium nitride, SixZryNz, with an atomic ratio of Zr to the sum Si+Zr, y/(x+y), which is between 25.0% and 40.0%, these values being incorporated, indeed even between 27.0% and 37.0%, these values being incorporated.

Abstract: Powder of particles, more than 95% by number of said particles exhibiting a circularity greater than or equal to 0.85, wherein said powder contains more than 99.8% of a rare earth oxide and/or of hafnium oxide and/or of yttrium aluminum oxide, as percentage by weight relative to the oxides, and has: a median particle size D 50 of between 10 and 40 microns and a size dispersion index (D 90?D 10)/D 50 of less than 3; a percentage by number of particles having a size less than or equal to 5 ?m which is less than 5%; an apparent-density dispersion index (P<50?P)/P of less than 0.

Abstract: A target of a nominal thickness includes molybdenum. The target has a lamellar microstructure and an oxygen content of less than 1000 ppm, preferably less than 600 ppm, and even more preferably less than 450 ppm. An electrical resistivity of the target is less than five times, preferably three times and more preferably twice the theoretical electrical resistivity of the compound.

Abstract: An abrasive article including a body including abrasive particles contained within a bond material, a first major surface, a second major surface, and a side surface extending between the first major surface and second major surface, and a coating overlying at least a portion of one of the first major surface or the second major surface. In an embodiment, the coating comprises at least one element selected from the group of chromium, nickel, carbon, nitrogen, tungsten, sulfur, molybdenum, iron, zinc, silicon, titanium, aluminum, zirconium, magnesium, zinc, boron, cobalt, calcium, or any combination thereof. In another embodiment, the coating comprises a cermet, a ceramic, or a combination thereof.

Abstract: Powder of particles, more than 95% by number of said particles exhibiting a circularity greater than or equal to 0.85, wherein said powder contains more than 99.8% of a rare earth oxide and/or of hafnium oxide and/or of yttrium aluminium oxide, as percentage by weight relative to the oxides, and has: a median particle size D 50 of between 10 and 40 microns and a size dispersion index (D 90?D 10)/D 50 of less than 3; a percentage by number of particles having a size less than or equal to 5 ?m which is less than 5%; an apparent-density dispersion index (P<50?P)/P of less than 0.

Abstract: Process for producing a target by thermal spraying, especially by plasma spraying, said target comprising at least one compound chosen from refractory metals, resistive oxides and volatile oxides, characterized in that at least one fraction of said compound in the form of a powder composition of said compound is sprayed by thermal spraying, onto at least one surface portion of the target, in a controlled atmosphere and in that powerful cryogenic cooling jets directed onto the target during its construction are used.

Abstract: The invention relates to a plasma torch, comprising: a plasma generator comprising a cathode extending along an axis X and an anode (24), the cathode and the anode being arranged so as to be capable of generating, in a chamber (26), an electric arc between the anode and the cathode due to an electrical voltage, the plasma generator also comprising a plasmagen gas injection device (30) comprising an injection pipe (72) leading, along an injection axis (Ii), to an injection opening (74) in the chamber; a means for injecting a material to be discharged into a plasma flow generated by said plasma generator, the plasma torch being characterized in that: the relationship R? between: the radial distance (yi) of said injection opening, defined as the minimum distance between the axis X and the center of said injection orifice; the largest transverse size (DC) of the cathode in the region of the chamber downstream from the position PAC, wherein PAC denotes the axial position of maximum radial mutual encroachment of th

Abstract: The invention relates to a coating for a device for forming glass products, comprising: a first quasicrystalline or approximant or amorphous metallic phase; and a second phase composed of a eutectic alloy having a melting point between 950 and 1150° C. and having a nominal hardness between 30 and 65 HRc; a mould for manufacturing hollow glass products that is provided with this coating; equipment for forming glass in sheets or plates that is provided with this coating; a material constituting this coating; a premixed or prealloyed powder, or a flexible cord or cored-wire that makes it possible to obtain this coating; a thermal spraying process for obtaining this coating.

Abstract: Target of nominal thickness (e), comprising at least one molybdenum-based compound, characterized in that it has: a lamellar microstructure; an oxygen content of less than 1000 ppm, preferably less than 600 ppm, and even more preferably less than 450 ppm; and an electrical resistivity less than five times, preferably three times and more preferably twice the theoretical electrical resistivity of the compound.

Abstract: The invention relates to a plasma torch, comprising: a plasma generator comprising a cathode extending along an axis X and an anode (24), the cathode and the anode being arranged so as to be capable of generating, in a chamber (26), an electric arc between the anode and the cathode due to an electrical voltage, the plasma generator also comprising a plasmagen gas injection device (30) comprising an injection pipe (72) leading, along an injection axis (Ii), to an injection opening (74) in the chamber; a means for injecting a material to be discharged into a plasma flow generated by said plasma generator, the plasma torch being characterized in that: the relationship R? between: the radial distance (yi) of said injection opening, defined as the minimum distance between the axis X and the center of said injection orifice; the largest transverse size (DC) of the cathode in the region of the chamber downstream from the position PAC, wherein PAC denotes the axial position of maximum radial mutual encroachment of th

Abstract: Process for producing a target by thermal spraying, especially by plasma spraying, said target comprising at least one compound chosen from refractory metals, resistive oxides and volatile oxides, characterized in that at least one fraction of said compound in the form of a powder composition of said compound is sprayed by thermal spraying, onto at least one surface portion of the target, in a controlled atmosphere and in that powerful cryogenic cooling jets directed onto the target during its construction are used.

Abstract: Method of producing a target by thermal spraying, especially by plasma spraying, said target comprising at least one compound based on atoms of different types chosen especially from the constituents M belonging to the (Zr, Mo, Ti, Nb, Ta, Hf, Cr) family and silicon, characterized in that at least one fraction of said compound, the constituents of which are bonded by covalent and/or ionic and/or metallic bonds, is injected into a plasma jet, said plasma jet spraying the constituents of said compound onto the target so as to deposit a coating of said compound on a surface portion of said target.

Abstract: The invention relates to a coating for a device for forming glass products, comprising: a first quasicrystalline or approximant or amorphous metallic phase; and a second phase composed of a eutectic alloy having a melting point between 950 and 1150° C. and having a nominal hardness between 30 and 65 HRc; a mould for manufacturing hollow glass products that is provided with this coating; equipment for forming glass in sheets or plates that is provided with this coating; a material constituting this coating; a premixed or prealloyed powder, or a flexible cord or cored-wire that makes it possible to obtain this coating; a thermal spraying process for obtaining this coating.

Abstract: The invention relates to a coating for a device for forming glass products, comprising: a first quasicrystalline or approximant or amorphous metallic phase; and a second phase composed of a eutectic alloy having a melting point between 950 and 1150° C. and having a nominal hardness between 30 and 65 HRc; a mould for manufacturing hollow glass products that is provided with this coating; equipment for forming glass in sheets or plates that is provided with this coating; a material constituting this coating; a premixed or prealloyed powder, or a flexible bead or flux-cored wire that makes it possible to obtain this coating; a thermal spraying process for obtaining this coating.

Abstract: Method of producing a target by thermal spraying, especially by plasma spraying, said target comprising at least one compound based on atoms of different types chosen especially from the constituents M belonging to the (Zr, Mo, Ti, Nb, Ta, Hf, Cr) family and silicon, characterized in that at least one fraction of said compound, the constituents of which are bonded by covalent and/or ionic and/or metallic bonds, is injected into a plasma jet, said plasma jet spraying the constituents of said compound onto the target so as to deposit a coating of said compound on a surface portion of said target.

Abstract: An article is provided that includes a substrate and a corrosion-resistant coating provided on the substrate. The substrate generally consists essentially of alumina, and the corrosion-resistant coating is provided so as to directly contact the substrate without the provision of intervening layers between the substrate and the corrosion-resistant coating, such as reaction products provided by high-temperature treatment processes. The corrosion-resistant coating generally consists essentially of a rare earth oxide, and has an adhesion strength not less than about 15 MPa. According to particular embodiments, the article is a ceramic component utilized and implemented in a semiconductor processing apparatus for processing semiconductor wafers.

Abstract: An article is provided that includes a substrate and a corrosion-resistant coating provided on the substrate. The substrate generally consists essentially of alumina, and the corrosion-resistant coating is provided so as to directly contact the substrate without the provision of intervening layers between the substrate and the corrosion-resistant coating, such as reaction products provided by high-temperature treatment processes. The corrosion-resistant coating generally consists essentially of a rare earth oxide, and has an adhesion strength not less than about 15 MPa. According to particular embodiments, the article is a ceramic component utilized and implemented in a semiconductor processing apparatus for processing semiconductor wafers.

Abstract: A method of depositing a coating is disclosed, which method calls for providing a substrate, and thermally spraying a ceramic powder thereon to form a coating. The ceramic powder has a garnet crystal structure phase, and the thermal spraying in turn forms a coating on the substrate that includes a garnet crystal structure phase.