Patents by Inventor Dominique Maria Altpeter

Dominique Maria Altpeter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polymer microneedles
    Patent number: 6924087
    Abstract: A method for producing microneedles. The method including disposing a first layer of a radiation sensitive polymer on to a working surface and selectively irradiating the first layer such that the first layer has at least one irradiated region and at least one non-irradiated region. The method also including developing the first layer so as to selectively remove one of the at least one irradiated region and the at least one non-irradiated region such that, at least part of at least one remaining region at least partially defines a form of at least part of a microneedle structure. A microneedle structure including a plurality of microneedles at least partially formed from a radiation sensitive polymer.
    Type: Grant
    Filed: March 27, 2003
    Date of Patent: August 2, 2005
    Assignee: Nano Pass Technologies Ltd.
    Inventors: Yehoshua Yeshurun, Meir Hefetz, Erwin Berenschot, Meint de Boer, Dominique Maria Altpeter, Garrit Boom
  • Polymer microneedles
    Publication number: 20040072105
    Abstract: A method for producing microneedles. The method including disposing a first layer of a radiation sensitive polymer on to a working surface and selectively irradiating the first layer such that the first layer has at least one irradiated region and at least one non-irradiated region. The method also including developing the first layer so as to selectively remove one of the at least one irradiated region and the at least one non-irradiated region such that, at least part of at least one remaining region at least partially defines a form of at least part of a microneedle structure. A microneedle structure including a plurality of microneedles at least partially formed from a radiation sensitive polymer.
    Type: Application
    Filed: March 27, 2003
    Publication date: April 15, 2004
    Applicant: Nano Pass Technologies Ltd.
    Inventors: Yehoshua Yeshurun, Meir Hefetz, Erwin Berenschot, Meint de Boer, Dominique Maria Altpeter, Gerrit Boom