Patents by Inventor Don D. Eisenhour

Don D. Eisenhour has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7087529
    Abstract: A chemical-mechanical abrasive composition for use in semiconductor processing uses abrasive particles having a non-spherical morphology.
    Type: Grant
    Filed: October 2, 2003
    Date of Patent: August 8, 2006
    Assignee: Amcol International Corporation
    Inventors: Mingming Fang, Michael R. Ianiro, Don D. Eisenhour
  • Patent number: 6235533
    Abstract: A method of determining a quantity of amorphous SiC2-containing impurities in a montmorillonite clay sample comprising the steps of: (a) analyzing the clay sample to determine the weight percent of SiO2 contained in the clay sample; (b) analyzing the clay sample for non-montmorillonite SiO2-containing crystalline components; (c) calculating the weight percent of SiO2 from step (a) that is derived from the montmorillonite and amorphous SiQ2-containing impurities by lowering the weight percent of SiO2 in step (a) based on the non-montmorillonite SiO2-containing crystalline impurities found in step (b); and (d) determining the amorphous SiO2-containing impurity portion of the SiO2 calculated in step (c) by further lowering the amount of SiO2 from step (c) until the amount of montmorillonite-derived SiO2 is consistent with one or more properties of the clay sample, the amount of further lowering being proportional to an amount of amorphous SiO2-containing impurities contained in the clay sample.
    Type: Grant
    Filed: March 18, 1998
    Date of Patent: May 22, 2001
    Assignee: AMCOL International Corporation
    Inventors: Semeon J. Tsipursky, Don D. Eisenhour, Gary W. Beall, Mark Clarey, James Edwards
  • Patent number: 6090734
    Abstract: A hydrothermal reaction which dissolves the amorphous silica and the crystalline silica impurities contained in a recovered, naturally occurring montmorillonite clay, and subsequently converts the dissolved silicas into a dioctahedral and/or trioctahedil smectite clay. The dissolution of silica is accomplished by adjusting the pH of an aqueous slurry of the recovered clay to a value of about 8.5 to about 10.0, preferably about 9.0 to about 9.5, at a temperature of at least about 150.degree. C., preferably about 180.degree. C. to about 250.degree. C., more preferably about 190.degree. C. to about 235.degree. C. Dissolved silica reacts with stoichiometric amounts of aluminum and/or magnesium and/or sodium added to the slurry, while at a temperature of at least about 150.degree. C., preferably about 185.degree. C. to about 250.degree. C.
    Type: Grant
    Filed: March 18, 1998
    Date of Patent: July 18, 2000
    Assignee: AMCOL International Corporation
    Inventors: Semeon J. Tsipursky, Don D. Eisenhour, Gary W. Beall, Marek R. Mosiewicz
  • Patent number: 6050509
    Abstract: A clay purification process, for removing impurities recovered with the clay, particularly a montmorillonite clay, includes the steps of separating the clay from rocks and other large non-clay impurities; dispersing the clay and smaller impurities in water, preferably at a concentration of at least about 4% by weight clay, based on the total weight of clay and water, more preferably about 6-10% by weight clay in water, to provide a clay slurry; passing the clay slurry through a series of hydrocyclones to remove the larger particles (impurities) while retaining clay particles having a size of about 100 microns or less, particularly about 80 microns or less; ion exchanging the clay to remove at least about 95% of the interlayer, multivalent (e.g.
    Type: Grant
    Filed: March 18, 1998
    Date of Patent: April 18, 2000
    Assignee: AMCOL International Corporation
    Inventors: Mark Clarey, James Edwards, Semeon J. Tsipursky, Gary W. Beall, Don D. Eisenhour