Patents by Inventor Don Jang

Don Jang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20260226628
    Abstract: A method for pre-treatment of a surface of a substrate prior to electroless copper deposition, the method including a) providing a substrate including an activated surface on a nonconductive material, the activated surface having an activator including a catalyzing metal; b) contacting the activated surface with an aqueous pre-treatment solution for pre-treating, the aqueous pre-treatment solution including copper ions, an inorganic acid, and a reducing agent, and having a pH below 6 to obtain a pre-treated surface; with the proviso that the reducing agent is capable to reduce copper ions in an alkaline pH, but not capable to reduce copper ions at pH below 6.
    Type: Application
    Filed: April 25, 2024
    Publication date: August 6, 2026
    Inventors: Sebastian Zarwell, Jennifer Raase, Don Jang, Tobias Bernhard
  • Patent number: 9713266
    Abstract: The present invention relates to a method for manufacture of fine line circuitry in the manufacture of printed circuit boards, IC substrates and the like. The method utilizes a first conductive layer on the smooth surface of a build-up layer and a second conductive layer selected from electrically conductive polymers, colloidal noble metals and electrically conductive carbon particles on the roughened walls of at least one opening which are formed after depositing the first conductive layer.
    Type: Grant
    Filed: February 6, 2013
    Date of Patent: July 18, 2017
    Assignee: Atotech Deutschland GmbH
    Inventors: Richard Nichols, Don Jang, Harald Riebel, Frank BrĂ¼ning
  • Publication number: 20150083602
    Abstract: The present invention relates to a method for manufacture of fine line circuitry in the manufacture of printed circuit boards, IC substrates and the like. The method utilizes a first conductive layer on the smooth surface of a build-up layer and a second conductive layer selected from electrically conductive polymers, colloidal noble metals and electrically conductive carbon particles on the roughened walls of at least one opening which are formed after depositing the first conductive layer.
    Type: Application
    Filed: February 6, 2013
    Publication date: March 26, 2015
    Inventors: Richard Nichols, Don Jang, Harald Riebel, Frank BrĂ¼ning