Abstract: A dual source system and method includes a high power laser used to determine elemental concentrations in a sample and a lower power device used to determine compounds present in the sample. A detector subsystem receives photons from the sample after laser energy from the high power laser strikes the sample and provides a first signal. The detector subsystem then receives photons from the sample after energy from the lower power device strikes the sample and provides a second signal. The high power laser is pulsed and the first signal is processed to determine elemental concentrations present in the sample. The lower power device is energized and the second signal is processed to determine compounds present in the signal. Based on the elemental concentrations and the compounds present, the compounds present in the sample are quantified.

Abstract: An XRF analysis apparatus includes a housing with a source of penetrating radiation to be directed at a sample and a detector for detecting fluoresced radiation from the sample. A shield is attachable to the housing to protect the user from radiation and a safety interlock is configured to detect whether or not the shield is attached to the housing. A controller is responsive to the safety interlock, and configured to monitor usage of the source of radiation at or above a predetermined power level when the shield is not attached to the housing and provide an output signal when the monitored usage of the source of penetrating radiation at or above the predetermined power level without the shield attached to the housing exceeds one or more predetermined thresholds.

Abstract: A dual source system and method includes a high power laser used to determine elemental concentrations in a sample and a lower power device used to determine compounds present in the sample. A detector subsystem receives photons from the sample after laser energy from the high power laser strikes the sample and provides a first signal. The detector subsystem then receives photons from the sample after energy from the lower power device strikes the sample and provides a second signal. The high power laser is pulsed and the first signal is processed to determine elemental concentrations present in the sample. The lower power device is energized and the second signal is processed to determine compounds present in the signal. Based on the elemental concentrations and the compounds present, the compounds present in the sample are quantified.

Abstract: An XRF analysis apparatus includes a housing with a source of penetrating radiation to be directed at a sample and a detector for detecting fluoresced radiation from the sample. A shield is attachable to the housing to protect the user from radiation and a safety interlock is configured to detect whether or not the shield is attached to the housing. A controller is responsive to the safety interlock, and configured to monitor usage of the source of radiation at or above a predetermined power level when the shield is not attached to the housing and provide an output signal when the monitored usage of the source of penetrating radiation at or above the predetermined power level without the shield attached to the housing exceeds one or more predetermined thresholds.

Abstract: A sorting system and method with a conveyance for transporting items to be sorted at a predetermined speed. An XRF spectrometer subsystem includes at least one x-ray source directing x-ray energy at an item carried by the conveyance and a detector responsive to x-rays emitted by the item and producing a spectral signal characterizing a leading edge of the item and a trailing edge of the item. A diverter subsystem downstream of the XRF subsystem is for diverting sorted items. An electronic processing subsystem is responsive to the detector signal and is configured to determine if the item is to be diverted based on the elemental makeup of the item from its x-ray spectrum. The same processing subsystem is also configured to calculate the position of the item on the conveyance based on the detector signal and together with the predetermined speed of the conveyance controlling the diverter subsystem to divert selected items.

Abstract: An XRF system, preferably handheld, includes an X-ray source for directing X-rays to a sample, a detector responsive to X-rays emitted by the sample, and a filter assembly with multiple filter materials located between the X-ray source and the detector. An analyzer is responsive to detector and is configured to analyze the intensities of X-rays irradiated by the sample at one power setting and to choose a filter material which suppresses certain intensities with respect to other intensities. A device, controlled by the analyzer, automatically moves the filter assembly to the chosen filter material and then the analyzer increases the power setting to analyze certain non-suppressed intensities.

Abstract: An XRF system, preferably handheld, includes an X-ray source for directing X-rays to a sample, a detector responsive to X-rays emitted by the sample, and a filter assembly with multiple filter materials located between the X-ray source and the detector. An analyzer is responsive to detector and is configured to analyze the intensities of X-rays irradiated by the sample at one power setting and to choose a filter material which suppresses certain intensities with respect to other intensities. A device, controlled by the analyzer, automatically moves the filter assembly to the chosen filter material and then the analyzer increases the power setting to analyze certain non-suppressed intensities.