Patents by Inventor Donald A. Schlosser

Donald A. Schlosser has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9618846
    Abstract: Provided herein are multi-layer stacks for use in extreme ultraviolet lithography tailored to achieve optimum etch contrast to shrink features and smooth the edges of features while enabling use of an optical leveling sensor with little or reduced error. The multi-layer stacks may include an atomically smooth layer with an average local roughness of less than a monolayer, and one or more underlayers, which may be between a target layer to be patterned and a photoresist. Also provided are methods of depositing multi-layer stacks for use in extreme ultraviolet lithography.
    Type: Grant
    Filed: February 25, 2016
    Date of Patent: April 11, 2017
    Assignee: Lam Research Corporation
    Inventors: Nader Shamma, Thomas Mountsier, Donald Schlosser
  • Publication number: 20160179005
    Abstract: Provided herein are multi-layer stacks for use in extreme ultraviolet lithography tailored to achieve optimum etch contrast to shrink features and smooth the edges of features while enabling use of an optical leveling sensor with little or reduced error. The multi-layer stacks may include an atomically smooth layer with an average local roughness of less than a monolayer, and one or more underlayers, which may be between a target layer to be patterned and a photoresist. Also provided are methods of depositing multi-layer stacks for use in extreme ultraviolet lithography.
    Type: Application
    Filed: February 25, 2016
    Publication date: June 23, 2016
    Inventors: Nader Shamma, Thomas Mountsier, Donald Schlosser
  • Publication number: 20140239462
    Abstract: Provided herein are multi-layer stacks for use in extreme ultraviolet lithography tailored to achieve optimum etch contrast to shrink features and smooth the edges of features while enabling use of an optical leveling sensor with little or reduced error. The multi-layer stacks may include an atomically smooth layer with an average local roughness of less than a monolayer, and one or more underlayers, which may be between a target layer to be patterned and a photoresist. Also provided are methods of depositing multi-layer stacks for use in extreme ultraviolet lithography.
    Type: Application
    Filed: February 20, 2014
    Publication date: August 28, 2014
    Inventors: Nader Shamma, Thomas Mountsier, Donald Schlosser
  • Patent number: 5524602
    Abstract: A Gyro-Kinetic Hydraulic Bow Stabilizer disclosed for the reduction of random force exerted by a state of the art compound bow. A piston assembly (quadraulic unit) includes a hollow cavity cylindrical chamber, calculated tension spring, opposing poller pistons, retaining ring and fasteners, along with a viscous fluid in a capsule housing. The housing includes a cylinder tube closed at both ends by secured caps, and attached at one end by an energy transferring mounting bolt. The quadraulic unit moves laterally along the elongation direction of the stabilizer and contacts a piston rod portion of said poller pistons against a cap wall of the housing, developing multiple hydraulic events. Conventional lateral stabilization, which exists along with internal stabilization of the hollow cavity, fires pressurized tuned ports of different axial orientation on the outer periphery of the quadraulic unit.
    Type: Grant
    Filed: May 17, 1994
    Date of Patent: June 11, 1996
    Inventors: Tim M. Papandrea, Donald A. Schlosser