Patents by Inventor Donald C. Hofer

Donald C. Hofer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6482566
    Abstract: A photoresist composition which includes hydroxycarborane either incorporated as a monomeric dissolution modifier or as pendent groups on a polymer backbone. The photoresist composition is particularly useful in a bilayer thin film imaging lithographic process in which ultraviolet radiation-imaging in a wavelength range of between about 365 nm and about 13 nm is employed.
    Type: Grant
    Filed: February 18, 2000
    Date of Patent: November 19, 2002
    Assignee: International Business Machines Corporation
    Inventors: Donald C. Hofer, Scott A. MacDonald, Arpan P. Mahorowala, Robert D. Miller, Josef Michl, Gregory M. Wallraff
  • Patent number: 5585220
    Abstract: The invention relates to a polymeric, radiation-sensitive resist composition comprising (i) iodonium sulfonate radiation sensitive acid generator; (ii) a polymer; and (iii) an acid labile compound.
    Type: Grant
    Filed: December 1, 1995
    Date of Patent: December 17, 1996
    Assignee: International Business Machines Corporation
    Inventors: Gregory Breyta, Richard A. DiPietro, Donald C. Hofer, Hiroshi Ito
  • Patent number: 5045608
    Abstract: Block copolymers of polyimide and poly (phenylquinoxaline) have been synthesized. They are useful, particularly as dielectric layers in thin film multilayer structures. The most preferred embodiments are formed from polyimides which are those from pyromellitic dianhydride and oxydianiline. The most preferred poly (phenylquinoxaline) is a monofunctional oligomer, which yields the best microstructure.
    Type: Grant
    Filed: September 27, 1989
    Date of Patent: September 3, 1991
    Assignee: IBM Corporation
    Inventors: James L. Hedrick, Jr., Donald C. Hofer, Jeffrey W. Labadie, Sally A. Swanson, Willi Volksen
  • Patent number: 4849501
    Abstract: A composition for the application of a planar polyimide coating having a glass transition temperature above 300.degree. C. comprises a solution in an anhydrous, aprotic solvent of an aromatic diamine and a dialkyldihydrogen pyromellitate which is more than 90% meta isomer.
    Type: Grant
    Filed: April 19, 1988
    Date of Patent: July 18, 1989
    Assignee: International Business Machines Corporation
    Inventors: Richard D. Diller, deceased, Anthony F. Arnold, Ying Ying Cheng, Patricia M. Cotts, Donald C. Hofer, Mahmoud Khojasteh, Elwood H. Macy, Prabodh R. Shah, Willi Volksen
  • Patent number: 4612210
    Abstract: A surface coating of high glass temperature and superior mechanical properties along with excellent planarization and gap filling is used to coat substrates. The coating comprises a polyamide alkyl ester from a pyromellitic alkyl diester and a para-linked aromatic diamine dissolved in a solvent containing at least 10% of a co-solvent boiling above 220.degree. C.
    Type: Grant
    Filed: July 25, 1985
    Date of Patent: September 16, 1986
    Assignee: International Business Machines Corporation
    Inventors: Donald C. Hofer, Debra B. LaVergne, Robert J. Twieg, Willi Volksen
  • Patent number: 4464460
    Abstract: A process for making an image oxygen-reactive ion etch barrier using a polysilane that is resistant to resistive ion etching and is also a positive acting resist.
    Type: Grant
    Filed: June 28, 1983
    Date of Patent: August 7, 1984
    Assignee: International Business Machines Corporation
    Inventors: Hiroyuki Hiraoka, Donald C. Hofer, Robert D. Miller, Lester A. Pederson, Carlton G. Willson
  • Patent number: 4291272
    Abstract: A method for line narrowing in nuclear magnetic resonance (NMR) studies in solids is described. The method employs quasi-continuous amplitude modulation of an rf field wherein the field is eliminated at intervals for short periods of time at or about the time when the amplitude for both the maximum and minimum approach zero, these intervals creating windows where the NMR signal can be observed.
    Type: Grant
    Filed: December 28, 1979
    Date of Patent: September 22, 1981
    Assignee: International Business Machines Corporation
    Inventors: Donald C. Hofer, Raymond D. Kendrick, Costantino S. Yannoni
  • Patent number: 4110681
    Abstract: An NMR (nuclear magnetic resonance) spectrometer has a permanent magnet provided with a field coil. A lock system cyclically pulses a deuterium lock sample to produce a FID (free induction decay) signal that is analyzed by measuring the time interval during which the FID signal crosses the zero axis a predetermined number of times. The measured interval is compared to a predetermined interval or set point, and the current through the field coil is adjusted in the direction tending to correct the field strength so as to maintain the measured interval equal to the preset interval. Such measurement, comparison and adjustment are done several times each second. When the sample is removed, the lock system retains the last field setting achieved with the sample.
    Type: Grant
    Filed: February 16, 1977
    Date of Patent: August 29, 1978
    Assignee: International Business Machines Corporation
    Inventors: Donald C. Hofer, Vincent N. Kahwaty, Carl R. Valentino
  • Patent number: 4081742
    Abstract: A method is described for the quantitative analysis of a solution in which the solvent produces a nuclear magnetic resonant (NMR) spectral peak that dominates the system. A first spectrum containing the peak is made by operation of a nuclear magnetic resonant spectrometer at a first gain setting. The NMR apparatus is a pulse-modulated, Fourier-transform type spectrometer. A second spectrum is produced in which a 180.degree. pulse is applied to invert the spectral component magnetization followed after a period of time by a 90.degree. pulse. The period of time is sufficient to allow the solvent or component producing the unwanted peak to relax from the inverted state to a point where there is minimum magnetization along the longitudinal axis. At this point, in many solutions the other components have completely relaxed so that the 90.degree.
    Type: Grant
    Filed: December 29, 1976
    Date of Patent: March 28, 1978
    Assignee: International Business Machines Corporation
    Inventors: Donald C. Hofer, Vincent N. Kahwaty, Carl R. Valentino
  • Patent number: RE34524
    Abstract: A composition for the application of a planar polymide coating having a glass transition temperature above 300.degree. C. comprises a solution in an anhydrous, aprotic solvent of .Iadd.the reaction product .Iaddend.of an aromatic diamine and a .[.dialkyldihydrogen.]. .Iadd.dialkyl .Iaddend.pyromellitate .Iadd.diacyl chloride .Iaddend.which .[.is more than.]. .Iadd.comprises about .Iaddend.90% .Iadd.or more .Iaddend.meta isomer.
    Type: Grant
    Filed: July 18, 1991
    Date of Patent: January 25, 1994
    Assignee: International Business Machines Corporation
    Inventors: Richard D. Diller, deceased, Anthony F. Arnold, Ying Y. Cheng, Patricia M. Cotts, Donald C. Hofer, Mahmoud M. Khojasteh, Elwood H. Macy, Prabodh R. Shah, Willi Volksen