Abstract: An etching/deposition system comprising a hollow cathode electron source in combination with a magnetron sputter deposition plasma device within a containment chamber, said hollow cathode being disposed to inject electrons into the magnetic field of the magnetron plasma device adjacent to the magnetron cathode surface to which a deposition source is affixed. Said system further includes means for initiating and maintaining a discharge plasma within the hollow cathode and for initiating and maintaining the magnetron plasma. The improvement of the invention comprises a workpiece to be coated, located in said chamber, spaced from said magnetron cathode surface which may be biased to attract particles emitted by said deposition source.