Patents by Inventor Donald J. Verplancken

Donald J. Verplancken has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of delivering activated species for rapid cyclical deposition
    Patent number: 6905737
    Abstract: A method for providing activated species for a cyclical deposition process is provided. In one aspect, the method includes delivering a gas to be activated into a plasma generator, activating the gas to create a volume of reactive species, delivering a fraction of the reactive species into a processing region to react within a substrate therein, and maintaining at least a portion of the the gas remaining in the plasma generator in an activated state after delivering the fraction of the gas into the process region. The plasma generator may include a high density plasma (HDP) generator, a microwave generator, a radio-frequency (RF) generator, an inductive-coupled plasma (ICP) generator, a capacitively coupled generator, or combinations thereof.
    Type: Grant
    Filed: October 11, 2002
    Date of Patent: June 14, 2005
    Assignee: Applied Materials, Inc.
    Inventors: Donald J. Verplancken, Ashok K. Sinha
  • Simultaneous cyclical deposition in different processing regions
    Patent number: 6875271
    Abstract: A method for simultaneous deposition of multiple compounds on a substrate is provided. In one aspect, a gas stream is introduced into a processing chamber and flows across a substrate surface disposed therein. The gas stream includes at least one dose of a first compound and at least one dose of a second compound. The doses of the first and second compounds are separated by a time delay, and the at least one dose of the first compound and the at least one dose of the second compound are simultaneously in fluid communication with the substrate surface.
    Type: Grant
    Filed: April 9, 2002
    Date of Patent: April 5, 2005
    Assignee: Applied Materials, Inc.
    Inventors: W. Benjamin Glenn, Donald J. Verplancken
  • Activated species generator for rapid cycle deposition processes
    Publication number: 20040071897
    Abstract: A method for providing activated species for a cyclical deposition process is provided. In one aspect, the method includes delivering a gas to be activated into a plasma generator, activating the gas to create a volume of reactive species, delivering a fraction of the reactive species into a processing region to react within a substrate therein, and maintaining at least a portion of the the gas remaining in the plasma generator in an activated state after delivering the fraction of the gas into the process region. The plasma generator may include a high density plasma (HDP) generator, a microwave generator, a radio-frequency (RF) generator, an inductive-coupled plasma (ICP) generator, a capacitively coupled generator, or combinations thereof.
    Type: Application
    Filed: October 11, 2002
    Publication date: April 15, 2004
    Applicant: Applied Materials, Inc.
    Inventors: Donald J. Verplancken, Ashok K. Sinha
  • Simultaneous cyclical deposition in different processing regions
    Publication number: 20030190804
    Abstract: A method for simultaneous deposition of multiple compounds on a substrate is provided. In one aspect, a gas stream is introduced into a processing chamber and flows across a substrate surface disposed therein. The gas stream includes at least one dose of a first compound and at least one dose of a second compound. The doses of the first and second compounds are separated by a time delay, and the at least one dose of the first compound and the at least one dose of the second compound are simultaneously in fluid communication with the substrate surface.
    Type: Application
    Filed: April 9, 2002
    Publication date: October 9, 2003
    Inventors: W. Benjamin Glenn, Donald J. Verplancken