Patents by Inventor Donald K. Stemple

Donald K. Stemple has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of detecting the endpoint of the etch of epitaxially grown silicon
    Patent number: 4717446
    Abstract: A method of detecting the endpoint of expitaxially grown silicon using a monitor wafer is described. A monitor wafer having a substrate, an oxide layer, and a polysilicon layer is process in an epi chamber along with working wafers. The monitor wafer is used to determine the endpoint of the working wafers epi layer when the epi layer is etched.
    Type: Grant
    Filed: September 18, 1986
    Date of Patent: January 5, 1988
    Assignee: Motorola Inc.
    Inventors: Andrew G. Nagy, Donald K. Stemple, Clarence J. Tracy
  • Reactive sputter cleaning of semiconductor wafer
    Patent number: 4585517
    Abstract: A method for cleaning semiconductor wafers prior to the sputter deposition of a metal is disclosed. Introducing a mixture of ninety percent argon and ten percent freon to a sputter deposition system to sputter etch the wafers thereby allowing for the removal of unwanted oxide.
    Type: Grant
    Filed: January 31, 1985
    Date of Patent: April 29, 1986
    Assignee: Motorola, Inc.
    Inventor: Donald K. Stemple