Patents by Inventor Donald Leslie Wilson

Donald Leslie Wilson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5728222
    Abstract: An apparatus in a chemical vapor deposition (CVD) system monitors the actual wafer/substrate temperature during the deposition process. The apparatus makes possible the production of high quality aluminum oxide films with real-time wafer/substrate control. An infrared (IR) temperature monitoring device is used to control the actual wafer temperature to the process temperature setpoint. This eliminates all atmospheric temperature probing. The need for test runs and monitor wafers as well as the resources required to perform the operations is eliminated and operating cost are reduced. High quality, uniform films of aluminum oxide can be deposited on a silicon substrates with no need for additional photolithographic steps to simulate conformality that are present in a sputtered (PVD) type application. The result is a reduction in required process steps with subsequent anticipated savings in equipment, cycle time, chemicals, reduce handling, and increased yield of devices on the substrate.
    Type: Grant
    Filed: October 12, 1995
    Date of Patent: March 17, 1998
    Assignee: International Business Machines Corporation
    Inventors: Steven George Barbee, Richard Anthony Conti, Alexander Kostenko, Narayana V. Sarma, Donald Leslie Wilson, Justin Wai-Chow Wong, Steven Paul Zuhoski
  • Patent number: 5665608
    Abstract: A method and apparatus for monitoring and controlling reactant vapors prior to chemical vapor deposition (CVD). The reactant vapors are monitored at full concentration without sampling as they are transported to a CVD reactor. Contaminants detected cause a process controller to switch the transport path to direct reactant vapors to a system pump.
    Type: Grant
    Filed: February 10, 1995
    Date of Patent: September 9, 1997
    Assignee: International Business Machines Corporation
    Inventors: Jonathan Daniel Chapple-Sokol, Richard Anthony Conti, James Anthony O'Neill, Narayana V. Sarma, Donald Leslie Wilson, Justin Wai-Chow Wong
  • Patent number: 5648113
    Abstract: A process and apparatus for Al.sub.2 O.sub.3 CVD on silicon wafers using aluminum tri-isopropoxide in a high-volume production environment is presented. The conditions required to use ATI in a production environment and provide maximum utilization of ATI are first of all delivery of ATI via direct evaporation. The ATI source bottle is pumped out (bypassing substrates) until propene and isopropanol signals are reduced to 1% of process pressure before start of aluminum oxide deposition. Either IR spectroscopy or mass spectrometry can be used to provide a control signal to the microprocessor controller. Heating the supplied tetramer to 120.degree. C. for two hours assures complete conversion to trimer. The ATI is stored at 90.degree. C. to minimize decomposition during idle periods and allow recovery of trimer upon return to 120.degree. C. for two hours. During periods of demand, the ATI is held at 120.degree. C. to minimize decomposition.
    Type: Grant
    Filed: September 30, 1994
    Date of Patent: July 15, 1997
    Assignee: International Business Machines Corporation
    Inventors: Steven George Barbee, Jonathan Daniel Chapple-Sokol, Richard Anthony Conti, Richard Hsiao, James Anthony O'Neill, Narayana V. Sarma, Donald Leslie Wilson, Justin Wai-Chow Wong, Steven Paul Zuhoski