Patents by Inventor Donald R. Sauer
Donald R. Sauer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20140208867Abstract: The open channel flow meter of the present invention uses a progressive spectral analyzer to increase the efficiency and accuracy thereof. This is accomplished by using a smaller degree fast Fourier transform covering small sections of the span of the sensor. Additional sections of the span are added to the analysis as required to cover the desired velocity range. This approach also allows one to bypass the processing of velocity spans outside the actual site conditions. This allows circuitry which costs less, uses less power, and achieves more precise readings in a shorter time period.Type: ApplicationFiled: April 2, 2014Publication date: July 31, 2014Applicant: FloWav, Inc.Inventors: JOHN BYRD, DONALD R. SAUER, BRUCE COHEN
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Patent number: 7030039Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapor and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.Type: GrantFiled: June 30, 2001Date of Patent: April 18, 2006Assignee: ASML Holding N.V.Inventors: Emir Gurer, Tom Zhong, John Lewellen, Edward C. Lee, Robert P. Mandal, James C. Grambow, Ted C. Bettes, Donald R. Sauer, Edmond R. Ward, Jung-Hoon Chun, Sangjun Han
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Patent number: 7018943Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapor and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.Type: GrantFiled: June 30, 2001Date of Patent: March 28, 2006Assignee: ASML Holding N.V.Inventors: Gurer Emir, Tom Zhong, John Lewellen, Edward C. Lee, Robert P. Mandal, James C. Grambow, Ted C. Bettes, Donald R. Sauer, Edmond R. Ward
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Patent number: 6977098Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapor and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.Type: GrantFiled: February 28, 2001Date of Patent: December 20, 2005Assignee: ASML Holding N.V.Inventors: Emir Gurer, Tom Zhong, John Lewellen, Ed Lee, Robert P. Mandal, James C. Grambow, Ted C. Bettes, Donald R. Sauer, Edmond R. Ward
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Publication number: 20020127334Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapor and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.Type: ApplicationFiled: June 30, 2001Publication date: September 12, 2002Inventors: Emir Gurer, Tom Zhong, John Lewellen, Edward C. Lee, Robert P. Mandal, James C. Grambow, Ted C. Bettes, Donald R. Sauer, Edmond R. Ward
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Publication number: 20020098283Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapor and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.Type: ApplicationFiled: June 30, 2001Publication date: July 25, 2002Inventors: Emir Gurer, Tom Zhong, John Lewellen, Edward C. Lee, Robert P. Mandal, James C. Grambow, Ted C. Dettes, Donald R. Sauer, Edmond R. Ward, Jung-Hoon Chun, Sangjun Han
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Publication number: 20020004100Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapor and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.Type: ApplicationFiled: February 28, 2001Publication date: January 10, 2002Inventors: Emir Gurer, Tom Zhong, John Lewellen, Ed Lee, Robert P. Mandal, James C. Grambow, Ted C. Bettes, Donald R. Sauer, Edmond R. Ward
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Patent number: 6238735Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapor and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.Type: GrantFiled: September 8, 1999Date of Patent: May 29, 2001Assignee: Silicon Valley Group, Inc.Inventors: Robert P. Mandal, James C. Grambow, Ted C. Dettes, Donald R. Sauer, Emir Gurer, Edmond R. Ward
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Patent number: 6002245Abstract: A dual regeneration bandgap voltage generator circuit includes both CMOS and bipolar regeneration bandgap voltage generator circuits. Each of the regeneration bandgap voltage generator circuits is formed by cross-coupling current mirror circuits of opposite conductivity types. Upon initial application of power, the CMOS circuit becomes active first due to its higher leakage current. The "on" current from the CMOS circuit is then used to initiate current conduction within the bipolar circuit. Once the bipolar circuit begins operating, it turns the CMOS circuit off.Type: GrantFiled: February 26, 1999Date of Patent: December 14, 1999Assignee: National Semiconductor CorporationInventor: Donald R. Sauer
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Patent number: 5963085Abstract: An interface stage for interfacing between input and output stages of a rail to rail comparator. The interface stage combines and amplifies four input stage output currents from the input stage, including by common base feeding them to a symmetrical set of virtual grounds, to generate a differential output signal for driving the output stage. In preferred embodiments, the interface stage includes two sets of bipolar transistors, each set connected in a common base configuration, which amplify each input stage output current and assert the resulting amplified signals to a pair of symmetrical virtual ground circuits. Each virtual ground circuit comprises a bipolar transistor and is configured to combine two of the amplified signals to generate one component of the differential output signal.Type: GrantFiled: May 14, 1998Date of Patent: October 5, 1999Assignee: National Semiconductor CorporationInventor: Donald R. Sauer
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Patent number: 5954878Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapour and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.Type: GrantFiled: June 16, 1997Date of Patent: September 21, 1999Assignee: Silicon Valley Group, Inc.Inventors: Robert P. Mandal, James C. Grambow, Ted C. Bettes, Donald R. Sauer, Emir Guegrer, Edmond R. Ward
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Patent number: 5670210Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapour and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.Type: GrantFiled: December 1, 1995Date of Patent: September 23, 1997Assignee: Silicon Valley Group, Inc.Inventors: Robert P. Mandal, James C. Grambow, Ted C. Bettes, Donald R. Sauer, Emir Gurer, Edmond R. Ward