Patents by Inventor Donald R. Sauer

Donald R. Sauer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140208867
    Abstract: The open channel flow meter of the present invention uses a progressive spectral analyzer to increase the efficiency and accuracy thereof. This is accomplished by using a smaller degree fast Fourier transform covering small sections of the span of the sensor. Additional sections of the span are added to the analysis as required to cover the desired velocity range. This approach also allows one to bypass the processing of velocity spans outside the actual site conditions. This allows circuitry which costs less, uses less power, and achieves more precise readings in a shorter time period.
    Type: Application
    Filed: April 2, 2014
    Publication date: July 31, 2014
    Applicant: FloWav, Inc.
    Inventors: JOHN BYRD, DONALD R. SAUER, BRUCE COHEN
  • Patent number: 7030039
    Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapor and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.
    Type: Grant
    Filed: June 30, 2001
    Date of Patent: April 18, 2006
    Assignee: ASML Holding N.V.
    Inventors: Emir Gurer, Tom Zhong, John Lewellen, Edward C. Lee, Robert P. Mandal, James C. Grambow, Ted C. Bettes, Donald R. Sauer, Edmond R. Ward, Jung-Hoon Chun, Sangjun Han
  • Patent number: 7018943
    Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapor and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.
    Type: Grant
    Filed: June 30, 2001
    Date of Patent: March 28, 2006
    Assignee: ASML Holding N.V.
    Inventors: Gurer Emir, Tom Zhong, John Lewellen, Edward C. Lee, Robert P. Mandal, James C. Grambow, Ted C. Bettes, Donald R. Sauer, Edmond R. Ward
  • Patent number: 6977098
    Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapor and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.
    Type: Grant
    Filed: February 28, 2001
    Date of Patent: December 20, 2005
    Assignee: ASML Holding N.V.
    Inventors: Emir Gurer, Tom Zhong, John Lewellen, Ed Lee, Robert P. Mandal, James C. Grambow, Ted C. Bettes, Donald R. Sauer, Edmond R. Ward
  • Publication number: 20020127334
    Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapor and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.
    Type: Application
    Filed: June 30, 2001
    Publication date: September 12, 2002
    Inventors: Emir Gurer, Tom Zhong, John Lewellen, Edward C. Lee, Robert P. Mandal, James C. Grambow, Ted C. Bettes, Donald R. Sauer, Edmond R. Ward
  • Publication number: 20020098283
    Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapor and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.
    Type: Application
    Filed: June 30, 2001
    Publication date: July 25, 2002
    Inventors: Emir Gurer, Tom Zhong, John Lewellen, Edward C. Lee, Robert P. Mandal, James C. Grambow, Ted C. Dettes, Donald R. Sauer, Edmond R. Ward, Jung-Hoon Chun, Sangjun Han
  • Publication number: 20020004100
    Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapor and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.
    Type: Application
    Filed: February 28, 2001
    Publication date: January 10, 2002
    Inventors: Emir Gurer, Tom Zhong, John Lewellen, Ed Lee, Robert P. Mandal, James C. Grambow, Ted C. Bettes, Donald R. Sauer, Edmond R. Ward
  • Patent number: 6238735
    Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapor and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.
    Type: Grant
    Filed: September 8, 1999
    Date of Patent: May 29, 2001
    Assignee: Silicon Valley Group, Inc.
    Inventors: Robert P. Mandal, James C. Grambow, Ted C. Dettes, Donald R. Sauer, Emir Gurer, Edmond R. Ward
  • Patent number: 6002245
    Abstract: A dual regeneration bandgap voltage generator circuit includes both CMOS and bipolar regeneration bandgap voltage generator circuits. Each of the regeneration bandgap voltage generator circuits is formed by cross-coupling current mirror circuits of opposite conductivity types. Upon initial application of power, the CMOS circuit becomes active first due to its higher leakage current. The "on" current from the CMOS circuit is then used to initiate current conduction within the bipolar circuit. Once the bipolar circuit begins operating, it turns the CMOS circuit off.
    Type: Grant
    Filed: February 26, 1999
    Date of Patent: December 14, 1999
    Assignee: National Semiconductor Corporation
    Inventor: Donald R. Sauer
  • Patent number: 5963085
    Abstract: An interface stage for interfacing between input and output stages of a rail to rail comparator. The interface stage combines and amplifies four input stage output currents from the input stage, including by common base feeding them to a symmetrical set of virtual grounds, to generate a differential output signal for driving the output stage. In preferred embodiments, the interface stage includes two sets of bipolar transistors, each set connected in a common base configuration, which amplify each input stage output current and assert the resulting amplified signals to a pair of symmetrical virtual ground circuits. Each virtual ground circuit comprises a bipolar transistor and is configured to combine two of the amplified signals to generate one component of the differential output signal.
    Type: Grant
    Filed: May 14, 1998
    Date of Patent: October 5, 1999
    Assignee: National Semiconductor Corporation
    Inventor: Donald R. Sauer
  • Patent number: 5954878
    Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapour and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.
    Type: Grant
    Filed: June 16, 1997
    Date of Patent: September 21, 1999
    Assignee: Silicon Valley Group, Inc.
    Inventors: Robert P. Mandal, James C. Grambow, Ted C. Bettes, Donald R. Sauer, Emir Guegrer, Edmond R. Ward
  • Patent number: 5670210
    Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapour and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.
    Type: Grant
    Filed: December 1, 1995
    Date of Patent: September 23, 1997
    Assignee: Silicon Valley Group, Inc.
    Inventors: Robert P. Mandal, James C. Grambow, Ted C. Bettes, Donald R. Sauer, Emir Gurer, Edmond R. Ward