Patents by Inventor Donald W. Racicot

Donald W. Racicot has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Positive photosensitive resin compositions
    Patent number: 9519216
    Abstract: The present disclosure relates to compositions that include at least one polybenzoxazole precursor polymer, at least one photoacid generator, and at least one basic compound. Articles, films, and methods related to these compositions are also disclosed.
    Type: Grant
    Filed: January 30, 2009
    Date of Patent: December 13, 2016
    Assignee: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: Ahmad A. Naiini, Il'ya Rushkin, William D. Weber, Donald W. Racicot
  • Positive photosensitive polybenzoxazole precursor compositions
    Patent number: 7803510
    Abstract: A heat resistant positive-working photosensitive PBO precursor composition comprising: (a) at least one polybenzoxazole precursor polymer; (a) at least one plasticizer compound; (b) at least one solvent; wherein the amount of the plasticizer present in the composition is an amount effective to reduce the sidewall angle of imaged and cured features in the coated film on the substrate to prevent stress failures in subsequent metallization of the substrate due to steep angles of the imaged features, and with the proviso that if the polybenzoxazole precursor polymer solely consists of polybenzoxazole precursor polymers that do not contain a photoactive moiety on the polymer, then (c) at least one photoactive compound is also present in the composition.
    Type: Grant
    Filed: August 7, 2006
    Date of Patent: September 28, 2010
    Assignee: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: Ahmad A. Naiini, David B. Powell, Donald W. Racicot, Il'ya Rushkin, William D. Weber
  • Novel Positive Photosensitive Resin Compositions
    Publication number: 20090197067
    Abstract: The present disclosure relates to compositions that include at least one polybenzoxazole precursor polymer, at least one photoacid generator, and at least one basic compound. Articles, films, and methods related to these compositions are also disclosed.
    Type: Application
    Filed: January 30, 2009
    Publication date: August 6, 2009
    Applicant: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: Ahmad A. Naiini, Ilya Rushkin, William Weber, Donald W. Racicot