Patents by Inventor Dong-Bi Shiueh

Dong-Bi Shiueh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6784226
    Abstract: A process for producing a styrenic resin composition includes the step of compounding a styrenic resin with greater than 2 wt % water and an antioxidant which is prepared by blending (a) 20 to 99.9 wt % of organic phosphite or phosphonite with (b) 0.1 to 80 wt % of acid-binding metal salt treated with a surface conditioning agent, prior to compounding with the styrenic resin.
    Type: Grant
    Filed: September 20, 2002
    Date of Patent: August 31, 2004
    Assignee: Chi Mei Corporation
    Inventors: Wen-Yi Su, Perry Dong-Bi Shiueh
  • Publication number: 20030114559
    Abstract: A process for producing a styrenic resin composition includes the step of compounding a styrenic resin with greater than 2 wt % water and an antioxidant which is prepared by blending (a) 20 to 99.9 wt % of organic phosphite or phosphonite with (b) 0.1 to 80 wt % of acid-binding metal salt treated with a surface conditioning agent, prior to compounding with the styrenic resin.
    Type: Application
    Filed: September 20, 2002
    Publication date: June 19, 2003
    Applicant: CHI MEI CORPORATION
    Inventors: Wen-Yi Su, Perry Dong-Bi Shiueh
  • Publication number: 20020002222
    Abstract: An organic phosphorus-containing antioxidant which is stablized against hydrolysis includes (a) 20 to 99.9 wt % of organic phosphite or phosphonite; and (b) 0.1 to 80 wt % of acid-binding metal salt treated with a surface conditioning agent, wherein the weight ratio of the surface conditioning agent to the acid-binding metal salt is 0.1 to 50 wt %:99.9 to 50 wt %, and the surface conditioning agent is selected from the group consisting of silanes, titanates, zirconates, aluminates, zirco-alumiates, non-ionic surfactants, and anionic surfactants.
    Type: Application
    Filed: July 28, 1999
    Publication date: January 3, 2002
    Inventors: CHING-FAN CHIU, KUN-CHANG LEE, WEN-YI SU, DONG-BI SHIUEH
  • Patent number: 5852124
    Abstract: A rubber-modified styrenic resin composition which has high falling impact strength, high gloss, high tensile strength and the product produced from which has little or no unpleasant odor is provided by controlling the residual styrenic monomers in the resin composition to a content of below 1500 ppm and the residual 4-vinyl cyclohexene to a content of below 150 ppm. The number average particle size of the butadienic rubber is 0.08 to 0.35 .mu.m, the amount of butadienic rubber particles having a particle size of below 0.1 .mu.m is 19.5 to 99%, the amount of the butadienic rubber particles having a particle size of between 0.1 to 0.25 .mu.m is 0.5 to 60%, and the amount of the butadienic rubber particles having a particle size greater than 0.25 .mu.m is 0.5 to 80%, based on the total number of the butadienic rubber particles.
    Type: Grant
    Filed: August 6, 1996
    Date of Patent: December 22, 1998
    Assignee: Chi Mei Corporation
    Inventors: Ching-Liang Wang, Dong-Bi Shiueh
  • Patent number: 5795936
    Abstract: A styrenic resin composition includes:(1) 5 to 90 weight percent of a graft copolymer (C) prepared by bulk or solution polymerization of 100 parts by weight of monomers including 80 to 45 parts by weight of vinyl aromatic monomers, 15 to 50 parts by weight of vinyl cyanide monomers, and 0 to 40 parts by weight of copolymerizable monomers, in the presence of 0.1 to 10 parts by weight of a rubber graft copolymer (A) having a weight average particle size of 0.05 to 0.8 .mu.m and 0.1 to 10 parts by weight of an acrylic copolymer (B);(2) 95 to 10 weight percent of a graft copolymer (D) prepared by emulsion polymerization of 50 to 15 parts by weight of a mixture of 45 to 80 parts by weight of vinyl aromatic monomers, 15 to 50 parts by weight of vinyl cyanide monomers and, optionally, 0 to 40 parts by weight of copolymerizable monomers, in the presence of 50 to 85 parts by weight of a butadiene rubber having a weight average particle size of 0.05 to 0.8 .mu.
    Type: Grant
    Filed: June 27, 1996
    Date of Patent: August 18, 1998
    Assignee: Chi Mei Corporation
    Inventors: Chuan-Ming Lin, Dong-Bi Shiueh
  • Patent number: 5668207
    Abstract: A styrenic resin composition with little foul odor is provided. The styrenic resin composition contains:(1) 99.995-95.0 wt % of a styrenic resin which is made from 5-100 wt % of rubbery graft copolymer (A) and 95-0 wt % of styrenic copolymer (B), wherein the rubbery graft copolymer (A) is prepared by graft polymerization of 50 to 90 wt % of vinyl aromatic monomers, 10 to 50 wt % of vinyl cyanide monomers and 0-40 wt % of copolymerizable monomers in the presence of rubbery polymer; and(2) 0.005-5.0 wt % of a sesquiterpene compound (C).
    Type: Grant
    Filed: August 6, 1996
    Date of Patent: September 16, 1997
    Assignee: Chi Mei Corporation
    Inventors: Wen-Ping Huang, Dong-Bi Shiueh
  • Patent number: 5432219
    Abstract: A styrenic resin composition for extrusion of sheets, films, pipes and profiles, includes (1) 100 parts by weight of a styrenic resin having 15 to 100% by weight of a styrenic graft copolymer (A) and 85 to 0% by weight of a styrenic polymer (B); and (2) 0.01 to 3.0 parts by weight of 2,2'-oxamido-bis-[ethyl-3-(3,5-di-tertiary butyl-4-hydroxyphenyl)propionate].
    Type: Grant
    Filed: March 31, 1994
    Date of Patent: July 11, 1995
    Assignee: Chie Mei Corporation
    Inventors: Dong-Bi Shiueh, Peter Chen, Jung-Tsang Su