Abstract: The present invention provides a multi-wefts inserting weaving machine, comprising a block arraying device comprising an upper plate and a lower plate which face each other and are movable upward and downward; and a plural number of unit blocks attached to the internal facing sides of the upper plate and the lower plate of the block arraying device through combining grooves, wherein the unit blocks include two grooves. Accordingly, a lattice woven structure can be easily woven from heavy-duty materials by the present multi-wefts inserting weaving machine.

Abstract: A method is provided for reforming a color filter array of a CMOS image sensor, wherein the method includes exposing the first cap oxide layer by removing the first micro-lens, the first cap oxide layer by removing the first micro-lens, the first OCM pattern and the first color filter array; removing the exposed first cap oxide layer; forming a second cap oxide layer on an entire surface of the semiconductor substrate; forming a second color filter array on the second cap oxide layer in correspondence with the unit pixel array region; forming a second OCM pattern on the second color filter array; exposing the metal pad by selectively etching the second cap oxide layer; and forming a second micro-lens on the second OCM pattern.