Abstract: The present invention relates to a flying-over beam pattern scanning hologram microscope device using a spatial modulation scanner and a translation stage. The present invention provides a flying-over beam pattern scanning hologram microscope device comprising: a scan beam generation unit which converts of a first beam and a second beam to a first spherical wave, and then makes the first and the second spherical waves interfere with each other to form a scan beam; a scanning unit, which comprises a spatial modulation scanner for controlling the scan beam in the horizontal direction, and a translation stage for moving an object in the vertical direction at the rear end of the projection unit; the projection unit projecting the scan beam onto an object plane; and a light collection unit which detects a beam that has passed through the objective lens again after being reflected or fluoresced from the object.

Abstract: A flying-over beam pattern scanning hologram microscope device includes: a scan beam generation unit which converts a first beam and a second beam to a first spherical wave and a second spherical wave, and then allows the first and second spherical waves to interfere with each other to form a scan beam; a scanning unit, which comprises a scan mirror for controlling the scan beam in the horizontal direction, and a translation stage for moving an object in the vertical direction at the rear end of the projection unit; the projection unit projecting the scan beam onto an object plane; and a light collection unit for detecting a beam that has passed through the objective lens again after fluorescing or being reflected from an object.