Patents by Inventor Dong-II Cha

Dong-II Cha has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150167166
    Abstract: Disclosed therein is a thin film deposition apparatus. The thin film deposition apparatus includes: a chamber having a predetermined inner space; a substrate support part disposed inside the chamber and supporting a substrate; and a gas supply device having at least one supply channel for supplying process gas to the substrate and an activation channel which has a gas activation unit for activating the process gas, wherein the activation channel has an opened lower portion and a sealed upper portion.
    Type: Application
    Filed: February 20, 2015
    Publication date: June 18, 2015
    Inventors: Sang-Soo Hwang, Woo-Jin Lee, Ki-Jo Shin, Dong-II Cha