Patents by Inventor Dong-Jun You
Dong-Jun You has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11956411Abstract: An image signal processor includes a register and a disparity correction unit. The register stores disparity data obtained from a pattern image data that an image senor generates, and the image sensor includes a plurality of pixels, and each of the pixel includes at least a first photoelectric conversion element and a second photoelectric conversion element. The image sensor generates the pattern image data in response to a pattern image located at a first distance from the image sensor. The disparity correction unit corrects a disparity distortion of an image data based on the disparity data to generate a result image data, and the image senor generates the image data by capturing an object.Type: GrantFiled: September 28, 2022Date of Patent: April 9, 2024Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Hee Kang, Young-Jun Song, Dong-Ki Min, Jong-Min You, Jee-Hong Lee, Seok-Jae Kang, Taek-Sun Kim, Joon-Hyuk Im
-
Patent number: 11940694Abstract: A method for manufacturing a light modulation device is provided. The light modulation device is capable of removing defects such as orientation irregularities. The light modulation device further improves the orientation state in the light modulation device that adjusts orientation of a liquid crystal compound or the like with a liquid crystal alignment film and a pressure-sensitive adhesive layer or adhesive layer.Type: GrantFiled: November 4, 2020Date of Patent: March 26, 2024Assignee: LG Chem, Ltd.Inventors: Jung Sun You, Dong Hyun Oh, Cheol Min Yun, Jin Hong Kim, Jung Woon Kim, Min Jun Gim
-
Publication number: 20220208057Abstract: An infinitely expandable display apparatus includes a set board outputting image data having a first resolution and a plurality of display circuits connected to one another through an interface circuit based on a cascading scheme to display the image data, each of the plurality of display circuits including an application specific integrated circuit (ASIC) embedded therein, wherein each of the plurality of display circuits includes a plurality of slave display circuits generating unit arrangement coordinate information based on a connection of the interface circuit and a master display circuit scaling the image data having the first resolution based on the unit arrangement coordinate information and transferring the scaled image data to the plurality of slave display circuits.Type: ApplicationFiled: November 9, 2021Publication date: June 30, 2022Inventors: Dong Jun You, Min Hoi Kim
-
Patent number: 9998095Abstract: A SAW filter includes a substrate, an upper bus bar arranged on the substrate, a lower bus bar arranged on the substrate so as to face the upper bus bar, a first finger IDT arranged so as to be connected to the upper bus bar at one end, a second finger IDT arranged so as to be connected to the lower bus bar at one end, a passivation part formed on the first finger IDT and the second finger IDT, a first metal part formed on the passivation part and including all area of the upper bus bar and a partial area of the first finger IDT, and a second metal part formed on the passivation part and including all area of the lower bus bar and a partial area of the second finger IDT.Type: GrantFiled: March 31, 2016Date of Patent: June 12, 2018Assignee: WISOL CO., LTD.Inventor: Dong Jun You
-
Patent number: 9654084Abstract: The present invention relates to a capacitor for a SAW filter, the SAW filter, and a method of manufacturing thereof, and more specifically, to a capacitor for a SAW filter including a first metal layer formed on a substrate; an insulation layer formed on the first metal layer; and a second metal layer formed on the insulation layer and overlapped with partially or totally of the first metal layer, in which the insulation layer is formed to be extended to the top of an IDT formed on the substrate, the SAW filter on which such a capacitor for a SAW filter is mounted, and a method of manufacturing thereof.Type: GrantFiled: January 21, 2015Date of Patent: May 16, 2017Assignee: WISOL CO., LTD.Inventor: Dong Jun You
-
Publication number: 20160294359Abstract: A SAW filter includes a substrate, an upper bus bar arranged on the substrate, a lower bus bar arranged on the substrate so as to face the upper bus bar, a first finger IDT arranged so as to be connected to the upper bus bar at one end, a second finger TOT arranged so as to be connected to the lower bus bar at one end, passivation part formed on the first finger IDT and the second finger IDT, a first metal part formed on the passivation part and including all area of the upper bus bar and a partial area of the first finger IDT, and a second metal part formed on the passivation part and including all area of the lower bus bar and a partial area of the second finger IDT.Type: ApplicationFiled: March 31, 2016Publication date: October 6, 2016Inventor: DONG JUN YOU
-
Publication number: 20160141107Abstract: The present invention relates to a capacitor for a SAW filter, the SAW filter, and a method of manufacturing thereof, and more specifically, to a capacitor for a SAW filter including a first metal layer formed on a substrate; an insulation layer formed on the first metal layer; and a second metal layer formed on the insulation layer and overlapped with partially or totally of the first metal layer, in which the insulation layer is formed to be extended to the top of an IDT formed on the substrate, the SAW filter on which such a capacitor for a SAW filter is mounted, and a method of manufacturing thereof.Type: ApplicationFiled: January 21, 2015Publication date: May 19, 2016Inventor: Dong Jun YOU
-
Publication number: 20060096613Abstract: A semiconductor wafer washing system can execute a method in which the washing solution is quickly changed over and over again without the need to alter the structure of the system. The wafer washing system includes a washing solution supply section in which a plurality of chemicals are stored separately, and from which selected ones of the chemicals can be supplied in a predetermined ratio into a washing tank. A circulation section includes circulation piping connected to the washing tank for circulating the washing solution to and from the tank. A discharge section selectively discharges residual chemicals or washing solution from the washing solution supply section, the washing tank and the circulation section. A controller controls the flow of chemicals and washing solution in the washing solution supply section, the circulation section and the discharge section, respectively.Type: ApplicationFiled: December 13, 2005Publication date: May 11, 2006Inventors: Dong-Jun You, Jong-Woon Oh
-
Publication number: 20050201747Abstract: A semiconductor wafer washing system can execute a method in which the washing solution is quickly changed over and over again without the need to alter the structure of the system. The wafer washing system includes a washing solution supply section in which a plurality of chemicals are stored separately, and from which selected ones of the chemicals can be supplied in a predetermined ratio into a washing tank. A circulation section includes circulation piping connected to the washing tank for circulating the washing solution to and from the tank. A discharge section selectively discharges residual chemicals or washing solution from the washing solution supply section, the washing tank and the circulation section. A controller controls the flow of chemicals and washing solution in the washing solution supply section, the circulation section and the discharge section, respectively.Type: ApplicationFiled: January 19, 2005Publication date: September 15, 2005Inventors: Dong-Jun You, Jong-Woon Oh
-
Patent number: 6863079Abstract: A semiconductor wafer washing system can execute a method in which the washing solution is quickly changed over and over again without the need to alter the structure of the system. The wafer washing system includes a washing solution supply section in which a plurality of chemicals are stored separately, and from which selected ones of the chemicals can be supplied in a predetermined ratio into a washing tank. A circulation section includes circulation piping connected to the washing tank for circulating the washing solution to and from the tank. A discharge section selectively discharges residual chemicals or washing solution from the washing solution supply section, the washing tank and the circulation section. A controller controls the flow of chemicals and washing solution in the washing solution supply section, the circulation section and the discharge section, respectively.Type: GrantFiled: September 20, 2001Date of Patent: March 8, 2005Assignee: Samsung Electronics Co., Ltd.Inventors: Dong-Jun You, Jong-Woon Oh
-
Patent number: 6777913Abstract: An apparatus and a method reduces charging time of a multi-battery with a plurality of battery units. A charging process and apparatus charges a first battery unit of a multi-battery, keeps checking whether a current charging the first battery unit reaches a prescribed value, selects and charges a selected second battery unit of the multi-battery along with the first battery unit if the preset value is reached, and charges the second battery unit with a limited maximum magnitude current when the first battery unit is completely charged. Dual-charging operations for both first and second battery units conducted in the present charging process can reduce total charging time of the multi-battery.Type: GrantFiled: July 3, 2002Date of Patent: August 17, 2004Assignee: LG Electronics Inc.Inventor: Dong Jun You
-
Patent number: 6751824Abstract: A wafer cleaning device is disclosed in which a brush is integrally formed with a nozzle for supplying pure water, such that a uniform water screen is formed on a surface of a wafer and particles on the wafer can be entirely removed. The cleaning device includes injectors for ejecting pure water supplied from a pure water supplier onto a wafer; nozzles disposed at one end of each of the injectors; and a brush for cleaning the wafer while moving horizontally between a center and edges of the wafer. The injectors include a first injector for ejecting pure water at an upper position of the wafer toward the center of the wafer, and a second injector disposed adjacent to the brush along one side of a brush arm, the brush arm supporting the brush and moving the brush and second injector toward the wafer.Type: GrantFiled: May 9, 2001Date of Patent: June 22, 2004Assignee: Samsung Electronics Co., Ltd.Inventors: Jong-Woon Oh, Dong-Jun You, Ju-Sang Byun, Seung-Hoon Kong
-
Publication number: 20030006734Abstract: An apparatus and a method reduces charging time of a multi-battery with a plurality of battery units. A charging process and apparatus charges a first battery unit of a multi-battery, keeps checking whether a current charging the first battery unit reaches a prescribed value, selects and charges a selected second battery unit of the multi-battery along with the first battery unit if the preset value is reached, and charges the second battery unit with a limited maximum magnitude current when the first battery unit is completely charged. Dual-charging operations for both first and second battery units conducted in the present charging process can reduce total charging time of the multi-battery.Type: ApplicationFiled: July 3, 2002Publication date: January 9, 2003Inventor: Dong Jun You
-
Publication number: 20020092547Abstract: A semiconductor wafer washing system can execute a method in which the washing solution is quickly changed over and over again without the need to alter the structure of the system. The wafer washing system includes a washing solution supply section in which a plurality of chemicals are stored separately, and from which selected ones of the chemicals can be supplied in a predetermined ratio into a washing tank. A circulation section includes circulation piping connected to the washing tank for circulating the washing solution to and from the tank. A discharge section selectively discharges residual chemicals or washing solution from the washing solution supply section, the washing tank and the circulation section. A controller controls the flow of chemicals and washing solution in the washing solution supply section, the circulation section and the discharge section, respectively.Type: ApplicationFiled: September 20, 2001Publication date: July 18, 2002Inventors: Dong-Jun You, Jong-Woon Oh
-
Publication number: 20020050015Abstract: A wafer cleaning device is disclosed in which a brush is integrally formed with a nozzle for supplying pure water, such that a uniform water screen is formed on a surface of a wafer and particles on the wafer can be entirely removed. The cleaning device includes injectors for ejecting pure water supplied from a pure water supplier onto a wafer; nozzles disposed at one end of each of the injectors; and a brush for cleaning the wafer while moving horizontally between a center and edges of the wafer. The injectors include a first injector for ejecting pure water at an upper position of the wafer toward the center of the wafer, and a second injector disposed adjacent to the brush along one side of a brush arm, the brush arm supporting the brush and moving the brush and second injector toward the wafer.Type: ApplicationFiled: May 9, 2001Publication date: May 2, 2002Inventors: Jong-Woon Oh, Dong-Jun You, Ju-Sang Byun, Seung-Hoon Kong