Abstract: Provided are an anti-icing film using a broadband plasmonic metasurface produced by co-self-assembling anisotropic gold nanorods and cellulose nanocrystal, and a method for manufacturing the same. A method for manufacturing an anti-icing film including: (a) preparing an ink for an anti-icing film including a bonded body of the cellulose nanocrystal and the anisotropic gold nanorods and a binary mixed solution; (b) coating a substrate with the prepared ink; and (c) evaporating the binary mixed solution from the coated ink, and an anti-icing film manufactured therefrom may be provided. In addition, provided is an anti-icing film having anti-icing/deicing effect only with light irradiation of a visible light wavelength, by including a substrate; and a film layer including a metasurface on the substrate, wherein the metasurface includes a composite arranged in a certain direction, in which the anisotropic gold nanorods and the cellulose nanocrystal particles are co-assembled.

Abstract: The present invention relates to a method of preparing a shape-reconfigurable micropatterned polymer haptic material using an electric field technique, and more particularly, to a method of preparing a shape-reconfigurable micro-patterned polymer thin film and a haptic material by controlling the orientation of a liquid-crystalline organic polymer using an electric field control system and inducing the generation of defect structures having a regular microstructure array in a polymer film.

Abstract: A structure for a physical unclonable function using spontaneous chiral symmetry breaking and a method of preparing the same are described, in which a chiral random pattern, which is unclonable and is observable with an optical microscope and a mobile phone camera, is formed using chiral photonic crystals in which chiral symmetry breaking occurs and is applied to a physical unclonable function (PUF), thereby attaining high encoding capacity, high recognition rate, and security while achieving high performance in reproducibility, uniqueness, unpredictability, and reconfigurability, and forming a desired pattern through a conventional photolithography method.

Abstract: The present invention relates to a composite characterized by comprising an aromatic liquid crystalline compound and a metal organic framework containing an anisotropic metal organic framework particle, wherein the anisotropic metal organic framework particle is reversibly switched between isotropy and anisotropy oriented in one direction; and a laminate comprising the composite. The composite of the present invention can orient the metal organic framework in one direction, and can precisely control the orientation direction.

Abstract: A display apparatus includes a display panel including a pixel and a gate line connected to the pixel. The apparatus includes a gate driving circuit including a stage that outputs a gate signal to the gate line. The stage includes a first pull-up transistor and a first pull-down transistor that are connected to each other with a first output terminal, which outputs the gate signal, therebetween. The stage includes a Q node and a Qb node that are respectively connected to the first pull-up transistor and the first pull-down transistor. The stage includes a 3a transistor and a 3b transistor which are located in a discharge path of the Q node and are connected in series with each other with a Qc node therebetween, and whose gate electrodes are connected to the Qb node. The stage includes a charging capacitor connected to the Qc node.

Abstract: The present invention relates to a structure for a physical unclonable function using spontaneous chiral symmetry breaking and a method of preparing the same, in which a chiral random pattern, which is unclonable and is observable with an optical microscope and a mobile phone camera, is formed using chiral photonic crystals in which chiral symmetry breaking occurs and is applied to a physical unclonable function (PUF), thereby attaining high encoding capacity, high recognition rate, and security while achieving high performance in reproducibility, uniqueness, unpredictability, and reconfigurability, and forming a desired pattern through a conventional photolithography method.

Abstract: The present invention relates to a method of preparing a shape-reconfigurable micropatterned polymer haptic material using an electric field technique, and more particularly, to a method of preparing a shape-reconfigurable micro-patterned polymer thin film and a haptic material by controlling the orientation of a liquid-crystalline organic polymer using an electric field control system and inducing the generation of defect structures having a regular microstructure array in a polymer film.

Abstract: A method is described for preparing a coating layer having highly aligned nanomaterial by applying shearing force to a composite of nano material and lyotropic liquid crystal material after mixing the nano material and the lyotropic liquid crystal material. The method includes (a) injecting a composite of nanomaterial and lyotropic liquid crystal into a space between an upper plate and a lower plate in a laminate; and (b) applying a shearing force to the composite of nanomaterial and lyotropic liquid crystal.

Abstract: Disclosed are photonic crystals containing photoresponsive molecules and a method of preparing the same. More particularly, it is possible to synthesize photonic crystals containing photoresponsive molecules that induce photoalignment of azobenzene by ultraviolet irradiation using bent-shaped liquid crystal molecules containing azobenzene, which causes photo-isomerization upon ultraviolet irradiation, form a periodic structure in a visible light region using a self-assembly phenomenon occurring as temperature decreases, realize a reflection color and enable reversible pattering.

Abstract: Disclosed are photonic crystals containing photoresponsive molecules and a method of preparing the same. More particularly, it is possible to synthesize photonic crystals containing photoresponsive molecules that induce photoalignment of azobenzene by ultraviolet irradiation using bent-shaped liquid crystal molecules containing azobenzene, which causes photo-isomerization upon ultraviolet irradiation, form a periodic structure in a visible light region using a self-assembly phenomenon occurring as temperature decreases, realize a reflection color and enable reversible pattering.

Abstract: The present invention relates to a method for preparing coating layer having highly aligned nanomaterial in a lyotropic liquid crystal matrix. More specifically, it relates to a method for preparing coating layer having highly aligned nanomaterial by applying shearing force to a composite of nano material and lyotropic liquid crystal material after mixing the nano material and the lyotropic liquid crystal material. The present invention has an advantage in that orientation of nanomaterials, which have a high industrial utilization but are difficult to control orientation, can be controlled very easily and simply by applying a shearing force using a medium, such as a lyotropic liquid crystal matrix which is extractable from nature, thereby cheap and biocompatible.

Abstract: A method of producing a polarizing light-emitting film using photoluminescent ferroelectric liquid crystal molecules, and a liquid crystal display including the polarizing light-emitting film, are described. The method includes forming a droplet by positioning photoluminescent ferroelectric liquid crystal molecules on a substrate modified to be molecular phobic, and applying an electric field in a horizontal direction to uniaxially orient the liquid crystal molecules. By such method, it is possible to produce the polarizing light-emitting film in which the photoluminescent ferroelectric liquid crystal molecules are uniaxially oriented to simultaneously act as the liquid crystal layer, the polarizing plate, and the color filter. The liquid crystal display including the polarizing light-emitting film is capable of improving polarization and contrast, and implementing colors even without a polarizing plate and color filter, thereby increasing light efficiency and power efficiency and reducing production cost.

Abstract: The present invention relates to a method for fabricating an array of nanoparticle clusters, in which a thermally transformable organic liquid crystal film having a periodic array of micro-sized dimple-like defect structures spontaneously transformed by thermal sublimation of liquid crystal molecules is used as a template, and nanoparticles form self-assembled clusters having a uniform size with respect to the defect structures, thereby achieving a periodic array of nanoparticle clusters.

Abstract: The present invention relates to a method of producing a polarizing light-emitting film using photoluminescent ferroelectric liquid crystal molecules, and a liquid crystal display including the polarizing light-emitting film, and more specifically, to a method of producing a polarizing light-emitting film including: forming a droplet by positioning photoluminescent ferroelectric liquid crystal molecules on a substrate modified to be molecular phobic, and applying an electric field in a horizontal direction to uniaxially orient the liquid crystal molecules, and a liquid crystal display including the polarizing light-emitting film.

Abstract: The present invention relates to a method for fabricating an array of nanoparticle clusters, in which a thermally transformable organic liquid crystal film having a periodic array of micro-sized dimple-like defect structures spontaneously transformed by thermal sublimation of liquid crystal molecules is used as a template, and nanoparticles form self-assembled clusters having a uniform size with respect to the defect structures, thereby achieving a periodic array of nanoparticle clusters.

Abstract: For patterning during integrated circuit fabrication, a first pattern of first masking structures is formed, and a buffer layer is formed on exposed surfaces of the first masking structures. Also, a second pattern of second masking structures is formed in recesses between the buffer layer at sidewalls of the first masking structures. Furthermore, the first and masking structures are formed from spin-coating respective high carbon containing materials. Such first and second masking structures pattern a target layer with higher pitch than possible with traditional photolithography.

Abstract: For patterning during integrated circuit fabrication, an image layer is activated for forming a respective first type polymer block at each of two nearest activated areas. A layer of block copolymer is formed on the image layer, and a plurality of the first type polymer blocks and a plurality of second and third types of polymer blocks are formed on an area of the image layer between outer edges of the two nearest activated areas, from the block copolymer. At least one of the first, second, and third types of polymer blocks are removed to form a variety of mask structures.

Abstract: Methods of forming a pattern and methods of fabricating a semiconductor device having a pattern are provided, the methods include forming a self-assembly induction layer including a first region and a second region on a semiconductor substrate. A block copolymer layer is coated on the self-assembly induction layer. A first pattern, a second pattern and a third pattern are formed by phase separating the block copolymer. At least one of the first, second and third patterns may be removed to form a preliminary pattern. An etching process may be performed using the preliminary pattern as an etching mask. The first pattern contains the same material as that of the second pattern, and the third pattern contains a material different from that of the first pattern.

Abstract: A method of forming fine patterns of a semiconductor device by using carbon (C)-containing films includes forming an etching target film on a substrate including first and second regions; forming a plurality of first C-containing film patterns on the etching target film in the first region; forming a buffer layer which covers top and side surfaces of the plurality of first C-containing film patterns; forming a second C-containing film; removing the second C-containing film in the second region; exposing the plurality of first C-containing film patterns by removing a portion of the buffer layer in the first and second regions; and etching the etching target film by using the plurality of first C-containing film patterns, and portions of the second C-containing film which remain in the first region, as an etching mask.

Abstract: A method of forming a fine pattern includes forming an organic guide layer on a substrate, forming a photoresist pattern on the organic guide layer, the photoresist pattern including a plurality of openings exposing portions of the organic guide layer, forming a material layer on the exposed portions of the organic guide layer and on the photoresist pattern, the material layer including block copolymers, and rearranging the material layer through phase separation of the block copolymers into a fine pattern layer, such that the fine pattern layer includes a plurality of first blocks and a plurality of second blocks arranged in an alternating pattern, the plurality of first blocks and the plurality of the second blocks having different repeating units of the block copolymers.