Abstract: A method (480, 580) of depositing layers of a thin-film transistor on a substrate using a sputter deposition source comprising at least one first pair of electrodes and at least one second pair of electrodes, the method comprising moving (482, 582) the substrate to a first vacuum chamber; depositing (484, 584) a first layer of the layers on the substrate by supplying the at least one first pair of electrodes with bipolar pulsed DC voltage, wherein a first material of the first layer comprises a first metal oxide; moving (486, 586) the substrate from the first vacuum chamber to a second vacuum chamber without a vacuum break; and depositing (488, 588) a second layer of the layers on the first layer by supplying the at least one second pair of electrodes with bipolar pulsed DC voltage, wherein a second material of the second layer comprises a second metal oxide, the second material being different from the first material.

Abstract: Disclosed herein is a system for managing chemicals using Radio-Frequency Identification (RFID). A storage facility identification tag, attached to a chemical storage facility in a laboratory, stores the unique identification code of the chemical storage facility and a list of chemicals. A chemical identification tag, attached to the cover of a chemical container, stores the unique identification code of the chemical storage facility and chemical-related information. A mobile terminal, provided with an RFID reader, receives and outputs the unique identification code of the chemical storage facility, the list of the chemicals, and the chemical-related information.