Patents by Inventor Dong-Kwan Hong

Dong-Kwan Hong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and methods for substrate processing and manufacturing integrated circuit devices
    Patent number: 10406567
    Abstract: A method for processing a substrate includes: loading a substrate in a processing space of a vessel; drying the substrate using a supercritical fluid of a first temperature in the processing space, and thermally decomposing a contamination source disposed in the processing space by transferring heat to the processing space by using a non-reactive fluid of a second temperature that is higher than the first temperature.
    Type: Grant
    Filed: May 26, 2015
    Date of Patent: September 10, 2019
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Dong-kwan Hong, Won-ho Jang, Sung-bae Kong
  • APPARATUS AND METHODS FOR SUBSTRATE PROCESSING AND MANUFACTURING INTEGRATED CIRCUIT DEVICES
    Publication number: 20160059277
    Abstract: A method for processing a substrate includes: loading a substrate in a processing space of a vessel; drying the substrate using a supercritical fluid of a first temperature in the processing space, and thermally decomposing a contamination source disposed in the processing space by transferring heat to the processing space by using a non-reactive fluid of a second temperature that is higher than the first temperature.
    Type: Application
    Filed: May 26, 2015
    Publication date: March 3, 2016
    Inventors: Dong-kwan Hong, Won-ho Jang, Sung-bae Kong
  • Wafer drying apparatus
    Patent number: 6598312
    Abstract: A wafer drying apparatus of increased efficiency in which isopropyl alcohol (IPA) supplied to a hood is activated by heat, thereby increasing its diffusion efficiency and enabling it to vaporize pure water on a wafer quickly, includes a washing tank for storing pure water, a hood positioned at an upper portion of the washing tank, an injection nozzle for ejecting IPA positioned in the hood, a storage tank for storing the IPA, a bubble maker in the storage tank to create IPA vapor, a nitrogen supplier for storing a carrier gas for transferring the IPA vapor in the storage tank to the hood, and a heater provided near the injection nozzle to heat the IPA vapor that is ejected through the injection nozzle to a predetermined temperature, thereby uniformly diffusing the IPA vapor.
    Type: Grant
    Filed: March 21, 2002
    Date of Patent: July 29, 2003
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Tae-Ho Kim, Dong-Kwan Hong, Nung-Suck Kang
  • Wafer drying apparatus
    Publication number: 20030009901
    Abstract: A wafer drying apparatus of increased efficiency in which isopropyl alcohol (IPA) supplied to a hood is activated by heat, thereby increasing its diffusion efficiency and enabling it to vaporize pure water on a wafer quickly, includes a washing tank for storing pure water, a hood positioned at an upper portion of the washing tank, an injection nozzle for ejecting IPA positioned in the hood, a storage tank for storing the IPA, a bubble maker in the storage tank to create IPA vapor, a nitrogen supplier for storing a carrier gas for transferring the IPA vapor in the storage tank to the hood, and a heater provided near the injection nozzle to heat the IPA vapor that is ejected through the injection nozzle to a predetermined temperature, thereby uniformly diffusing the IPA vapor.
    Type: Application
    Filed: March 21, 2002
    Publication date: January 16, 2003
    Inventors: Tae-Ho Kim, Dong-Kwan Hong, Nung-Suck Kang