Patents by Inventor Dong Mok Shin

Dong Mok Shin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170247610
    Abstract: The invention described in the present specification relates to a color conversion film including a resin matrix; and an organic fluorescent substance dispersed in the resin matrix, wherein the organic fluorescent substance includes a green fluorescent substance having a maximum light emission wavelength in a 510 nm to 560 nm range when irradiating light including a 450 nm wavelength, and a red fluorescent substance having a maximum light emission wavelength in a 600 nm to 660 nm range when irradiating light including a 450 nm wavelength, the green fluorescent substance and the red fluorescent substance have a molar ratio of 5:1 to 50:1, and the color conversion film has a light emission peak with a full width at half maximum (FWHM) of 50 nm or less in a 510 nm to 560 nm range and a light emission peak with a FWHM of 90 nm or less in a 600 nm to 660 nm range when irradiating light, a method for preparing the same, and a backlight unit including the color conversion film.
    Type: Application
    Filed: February 1, 2016
    Publication date: August 31, 2017
    Inventors: Nari KIM, Sehwan SON, Dong Mok SHIN, Ji Ho KIM, Joo Yeon SEO, Byeong In AHN, Du Hyeon SHIN
  • Patent number: 9745468
    Abstract: The present invention relates to a polyurethane resin composition for a support pad including a polyurethane resin, a DMF solvent, an anionic surfactant, and polyethylene glycol (PEG), and a polyurethane support pad including the polyurethane resin composition for a support pad. According to the present invention, long and large pores may be uniformly formed therein, and thus a support pad having an excellent compression rate and compression recovery rate may be provided.
    Type: Grant
    Filed: August 17, 2012
    Date of Patent: August 29, 2017
    Assignee: LG CHEM, LTD.
    Inventors: Dong-Mok Shin, Na-Ri Kim, Byeong-In Ahn, Sang-Soon Choi, Young-Ji Tae, Keong-Yeon Yoon
  • Publication number: 20170159910
    Abstract: The invention described in the present specification relates to a color conversion film including: a substrate; a color conversion layer provided on the substrate; and a pressure-sensitive adhesive or adhesive layer provided on the color conversion layer, in which the color conversion layer includes an organic fluorescent material dispersed therein and the pressure-sensitive adhesive or adhesive layer includes light diffusion particles dispersed therein, a backlight unit including the same, and a display device including the same.
    Type: Application
    Filed: December 2, 2016
    Publication date: June 8, 2017
    Inventors: Joo Yeon SEO, Byeong In Ahn, Dong Mok Shin, Nari Kim, Seijing Park, Taesung Park, Ji Ho Kim, Hye Mi Oh
  • Publication number: 20170148243
    Abstract: Disclosed are a method and system for managing access to a door using a beacon signal.
    Type: Application
    Filed: August 10, 2016
    Publication date: May 25, 2017
    Applicant: SUPREMA INC.
    Inventors: Dong Mok SHIN, Seong Bin CHOI, Jae Won LEE
  • Publication number: 20160230961
    Abstract: The invention described in the present specification relates to a color conversion film including a color conversion layer including a resin matrix; and an organic fluorescent substance dispersed in the resin matrix, and absorbing blue or green light and emitting light having a wavelength different from the absorbing light; and an adhesive layer provided on at least one surface of the color conversion layer, and including a curing material of a radical polymerizable compound having a molecular weight of 300 or higher prior to curing, and a back light unit and a display apparatus including the same.
    Type: Application
    Filed: February 4, 2016
    Publication date: August 11, 2016
    Inventors: Joo Yeon Seo, Kwang Seung Park, Byeong In Ahn, Dong Mok Shin, Nari Kim, Ji Ho Kim
  • Publication number: 20160230960
    Abstract: The invention described in the present specification relates to a color conversion film including a color conversion layer including a resin matrix; and an organic fluorescent substance dispersed in the resin matrix, and absorbing blue or green light and emitting light having a wavelength different from the absorbing light; and a sticking sheet provided on at least one surface of the color conversion layer, and including a cured material of a radical curable component, a method for manufacturing the same, and a back light unit.
    Type: Application
    Filed: February 3, 2016
    Publication date: August 11, 2016
    Inventors: Joon Yeon SEO, Byeong In Ahn, Dong Mok Shin, Nari Kim, Kyung Yul Bae, Ji Ho Kim
  • Publication number: 20160223162
    Abstract: The invention described in the present specification relates to a color conversion film including a resin matrix; and an organic fluorescent substance, wherein the organic fluorescent substance includes a first fluorescent substance and a second fluorescent substance, and the first fluorescent substance has a light emission peak with FWHM of 60 nm or less and a Stokes shift of 30 nm or less when irradiating light having a light emission peak at 450 nm, a FWHM of 40 nm or less and monomodal light emission intensity distribution, a method for preparing the same, and a back light unit including the color conversion film.
    Type: Application
    Filed: January 29, 2016
    Publication date: August 4, 2016
    Inventors: Dong Mok SHIN, Byeong In AHN, Nari KIM, Hoyong LEE, Ji Ho KIM, Joo Yeon SEO
  • Publication number: 20160223728
    Abstract: The invention described in the present specification relates to a color conversion film including a resin matrix; and an organic fluorescent substance, wherein the color conversion film has a light emission peak with FWHM of 70 nm or less when irradiating light having a light emission peak of a 450 nm wavelength, a FWHM of 40 nm or less and monomodal light emission intensity distribution, and a ratio of light emission intensity at 600 nm to light emission intensity at a maximum light emission wavelength is 1:3 or higher, a method for preparing the same, and a back light unit including the color conversion film.
    Type: Application
    Filed: January 28, 2016
    Publication date: August 4, 2016
    Inventors: Dong Mok SHIN, Byeong In AHN, Nari KIM, Ji Ho KIM, Joo Yeon SEO
  • Patent number: 9223121
    Abstract: An optical structure for acquiring a fingerprint image with high resolution and minimum distortion is provided. The optical structure includes a prism configured to comprise an input surface to which light is irradiated, a contact surface formed horizontally to be in contact with a finger, and an output surface through which the light that has been irradiated to the input surface and reflected from the finger in contact with the contact surface passes; a lighting unit configured to emit a beam to the input surface of the prism; a reflector unit configured to reflect a fingerprint image passing through the output surface of the prism; a lens unit configured to comprise two or more lenses, each being configured to receive the fingerprint image reflected from the reflector unit; and an image sensor on which the fingerprint image passing through the lens unit is formed.
    Type: Grant
    Filed: August 4, 2011
    Date of Patent: December 29, 2015
    Assignee: Suprema Inc.
    Inventors: Dong Mok Shin, Jae Hyeon Park, Jae Won Lee
  • Patent number: 9133299
    Abstract: The present invention relates to a polyurethane resin composition including a first polyurethane resin and a second polyurethane resin that are different from each other in their compositions, an organic solvent, and a surfactant, and a polyurethane mounting pad manufactured from the resin composition.
    Type: Grant
    Filed: July 16, 2012
    Date of Patent: September 15, 2015
    Assignee: LG CHEM, LTD.
    Inventors: Sang-Soon Choi, Young-Ji Tae, Dong-Mok Shin, Keong-Yeon Yoon, Na-Ri Kim, Byeong-In Ahn
  • Patent number: 9080079
    Abstract: The present invention relates to a slurry for chemical mechanical polishing, comprising an abrasive; an oxidant; an organic acid; and a polymeric additive comprising polyolefin-polyalkyleneoxide copolymer, wherein the polyolefin-polyalkyleneoxide copolymer comprises a polyolefin repeat unit and two or more polyalkyleneoxide repeat units, and at least one polyalkyleneoxide repeat unit is branched.
    Type: Grant
    Filed: April 22, 2010
    Date of Patent: July 14, 2015
    Assignee: LG CHEM, LTD.
    Inventors: Eun-Mi Choi, Dong-Mok Shin, Seung-Beom Cho
  • Patent number: 8920220
    Abstract: This disclosure relates to a polishing pad for chemical mechanical polishing, having a shape where 3 or more semi-oval or semicircular curves that connect 2 valleys neighboring on the plane are connected, and including 2 or more modified patterns that are formed to a determined thickness on the polishing pad, wherein a peak of one modified pattern and a valley of another modified pattern neighboring thereto are sequentially located on the same line. The polishing pad may uniformly disperse slurry over the whole area during a polishing process to provide improved polishing uniformity, and appropriately control residence time of the slurry to increase polishing rate.
    Type: Grant
    Filed: September 15, 2011
    Date of Patent: December 30, 2014
    Assignee: LG Chem, Ltd.
    Inventors: Ah-Ram Kim, Byeong-In Ahn, Dong-Mok Shin
  • Patent number: 8822339
    Abstract: The present invention relates to a CMP slurry composition comprising an abrasive particle; a dispersant; an ionic polymer additive; and a non-ionic polymer additive including a polyolefin-polyethylene glycol copolymer including at least two polyethylene glycol repeat unit as a backbone and at least a polyethylene glycol repeating unit as a side chain, and a polishing method with using the slurry composition. The CMP slurry composition shows a low polishing rate to a single-crystalline silicon layer or a polysilicon layer and a high polishing rate to a silicon oxide layer, resulting in having an excellent polishing selectivity.
    Type: Grant
    Filed: October 13, 2010
    Date of Patent: September 2, 2014
    Assignee: LG Chem, Ltd.
    Inventors: Dong-Mok Shin, Eun-Mi Choi, Seung-Beom Cho
  • Publication number: 20140206784
    Abstract: The present invention relates to a polyurethane resin composition for a support pad including a polyurethane resin, a DMF solvent, an anionic surfactant, and polyethylene glycol (PEG), and a polyurethane support pad including the polyurethane resin composition for a support pad. According to the present invention, long and large pores may be uniformly formed therein, and thus a support pad having an excellent compression rate and compression recovery rate may be provided.
    Type: Application
    Filed: August 17, 2012
    Publication date: July 24, 2014
    Applicant: LG CHEM, LTD.
    Inventors: Dong-Mok Shin, Na-Ri Kim, Byeong-In Ahn, Sang-Soon Choi, Young-Ji Tae, Keong-Yeon Yoon
  • Patent number: 8670599
    Abstract: A fingerprint authentication apparatus and method which processes fingerprint data input through a plurality of fingerprint sensors and uses the processed fingerprint data in authentication to thereby increase security and performance. The fingerprint authentication apparatus includes a first sensor configured to acquire first fingerprint data from a user; a second sensor configured to acquire second fingerprint data that is different from the first fingerprint data; and a control unit configured to determine whether or not to authenticate the user based on similarities obtained from the comparison of each of the first fingerprint data and the second fingerprint data with registered fingerprint data.
    Type: Grant
    Filed: December 28, 2011
    Date of Patent: March 11, 2014
    Assignee: SUPREMA Inc.
    Inventors: Jea-Won Lee, Bong-Seop Song, Young-Soo Moon, Ja-Sung Ku, Seong-Jik Lee, Dong-Mok Shin
  • Patent number: 8481149
    Abstract: This disclosure relates to a polyurethane resin composition for a mounting pad, including a polyurethane resin, C9-15 alkyl benzene sulfonic acid or a salt thereof, and a DMF solvent, and a polyurethane mounting pad using the same, whereby long and large pores may be uniformly formed thereinside to provide a mounting pad having low hardness, excellent compressibility, and a high compression modulus.
    Type: Grant
    Filed: September 15, 2011
    Date of Patent: July 9, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Na-Ri Kim, Dong-Mok Shin, Byeong-In Ahn, Sang-Soon Choi, Keong-Yeon Yoon
  • Publication number: 20130018118
    Abstract: The present invention relates to a polyurethane resin composition including a first polyurethane resin and a second polyurethane resin that are different from each other in their compositions, an organic solvent, and a surfactant, and a polyurethane mounting pad manufactured from the resin composition.
    Type: Application
    Filed: July 16, 2012
    Publication date: January 17, 2013
    Applicant: LG CHEM, LTD.
    Inventors: Sang-Soon CHOI, Young-Ji TAE, Dong-Mok SHIN, Keong-Yeon YOON, Na-Ri KIM, Byeong-In AHN
  • Patent number: 8303918
    Abstract: In a method for preparing cerium carbonate powder by mixing a cerium precursor solution with a urea solution and carrying out a precipitation reaction, wherein the cerium carbonate powder has a hexagonal crystal structure, by using at least one type of organic solvent as a solvent for either or both the cerium precursor solution and the urea solution, and adjusting temperature of the precipitation reaction within a range of 120° C. to 300° C. Also, the method can yield cerium carbonate powder, cerium oxide powder from the cerium carbonate powder, and CMP slurry including the cerium oxide powder as an abrasive. In the method, urea as a precipitant can improve the uniformity of a reaction, and thus it is possible to easily and inexpensively obtain cerium carbonate powder with a hexagonal crystal structure without the danger by high-temperature high-pressure and the need for an expensive system in hydrothermal synthesis.
    Type: Grant
    Filed: March 14, 2008
    Date of Patent: November 6, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Myoung-Hwan Oh, Seung-Beom Cho, Jun-Seok Nho, Jong-Pil Kim, Jang-Yul Kim, Dong-Mok Shin
  • Publication number: 20120270399
    Abstract: The present invention relates to a CMP slurry composition comprising an abrasive particle; a dispersant; an ionic polymer additive; and a non-ionic polymer additive including a polyolefin-polyethylene glycol copolymer including at least two polyethylene glycol repeat unit as a backbone and at least a polyethylene glycol repeating unit as a side chain, and a polishing method with using the slurry composition. The CMP slurry composition shows a low polishing rate to a single-crystalline silicon layer or a polysilicon layer and a high polishing rate to a silicon oxide layer, resulting in having an excellent polishing selectivity.
    Type: Application
    Filed: October 13, 2010
    Publication date: October 25, 2012
    Applicant: LG CHEM, LTD.
    Inventors: Dong-Mok Shin, Eun-Mi Choi, Seung-Beom Cho
  • Publication number: 20120147168
    Abstract: An optical structure for acquiring a fingerprint image with high resolution and minimum distortion is provided. The optical structure includes a prism configured to comprise an input surface to which light is irradiated, a contact surface formed horizontally to be in contact with a finger, and an output surface through which the light that has been irradiated to the input surface and reflected from the finger in contact with the contact surface passes; a lighting unit configured to emit a beam to the input surface of the prism; a reflector unit configured to reflect a fingerprint image passing through the output surface of the prism; a lens unit configured to comprise two or more lenses, each being configured to receive the fingerprint image reflected from the reflector unit; and an image sensor on which the fingerprint image passing through the lens unit is formed.
    Type: Application
    Filed: August 4, 2011
    Publication date: June 14, 2012
    Inventors: Dong Mok Shin, Jae Hyeon Park, Jae Won Lee