Abstract: A device fabrication method includes: (1) providing a growth substrate including an oxide layer; (2) forming a metal layer over the oxide layer; (3) forming a stack of device layers over the metal layer; (4) performing fluid-assisted interfacial debonding of the metal layer to separate the stack of device layers and the metal layer from the growth substrate; and (5) affixing the stack of device layers to a target substrate.

Abstract: A device fabrication method includes: (1) providing a growth substrate including a base and an oxide layer disposed over the base; (2) forming a metal layer over the oxide layer; (3) forming a stack of device layers over the metal layer; (4) performing interfacial debonding of the metal layer to separate the stack of device layers and the metal layer from the growth substrate; and (5) affixing the stack of device layers to a target substrate.

Abstract: A device fabrication method includes: (1) providing a growth substrate including a base and an oxide layer disposed over the base; (2) forming a metal layer over the oxide layer; (3) forming a stack of device layers over the metal layer; (4) performing interfacial debonding of the metal layer to separate the stack of device layers and the metal layer from the growth substrate; and (5) affixing the stack of device layers to a target substrate.

Abstract: Disclosed herein is a method of manufacturing a metal flake, including the steps of: applying metal ink containing an organic metal compound onto a substrate; calcining the metal ink applied on the substrate to form a thin metal film; separating the formed thin metal film from the substrate; and pulverizing the separated thin metal film. The method of manufacturing a metal flake is characterized in that the thickness and size of metal flakes can be easily adjusted, metal flakes having excellent conductivity and gloss can be obtained, and metal flakes can be mass-produced using environmentally friendly and economical methods.