Patents by Inventor Dong S. Jang

Dong S. Jang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • E-beam exposure apparatus
    Patent number: 7939813
    Abstract: An e-beam exposure apparatus includes an electron gun provide an e-beam for exposure to a resist layer formed on a substrate; an e-beam column part inducing the path of the e-beam generated from the electron gun; and an electron collecting part disposed at the periphery of the path of the e-beam projected from the e-beam column part on the resist layer to absorb scattered electrons resulting from emission of the incident e-beam from the resist layer.
    Type: Grant
    Filed: November 26, 2008
    Date of Patent: May 10, 2011
    Assignee: Hynix Semiconductor Inc.
    Inventor: Dong S. Jang