Abstract: Proposed is an incubator that comprises a body including a bottom plate to lay a baby on an upper portion, a fixed frame connected at a lower portion to a side of the body, an elevation frame connected to the fixed frame and configured to be moved up and down with respect to the fixed frame, a heater configured in conjunction with movement of the elevation frame and being moved up and down with up-down movement of the elevation frame, a hood connected to the elevation frame and configured to open and close a top of the body by moving up and down in conjunction with movement of the elevation frame, and a driving mechanism for moving up and down the elevation frame and the hood, and further comprises a tilting means of tilting the heater at a predetermined angle in conjunction with up-down movement of the elevation frame.

Abstract: The present invention relates to an incubator comprising: a main body part which has a space formed therein for accommodating an infant; supports of which the lower portions are connected to one side of the main body part; a hood driving part provided with one or more multi joint link units and pivotably coupled to the supports; a hood which is disposed above the main body part, and opens and closes the main body part by means of the operation of the hood driving part; and a heater which is mounted to the hood driving part and changes position so that a heat radiating part faces away from the main body part when the main body part is closed, and faces the main body part when the main body part is open. Thus, the present invention can be easily converted for use as a warmer.

Abstract: The present invention relates to a focusing apparatus for a reflector shadowless lamp, and to a multi-synchronizing focusing apparatus for a reflector shadowless lamp, which synchronizes multiple focusings so as to implement various light field diameter sizes necessary for the shadowless lamp, thereby conveniently implementing light field diameter sizes necessary for various surgical environments.

Abstract: The present invention relates to a fuel injecting apparatus for an internal combustion engine, in which exhaust gas is applied to the injection of fuel. According to the fuel injecting apparatus, a portion of hot exhaust gas is introduced in front of the outlet of the fuel injector allowing hot exhaust gas to promote the fine particle formation and vaporization of fuel thereby enhancing efficiency of fuel. Again, a portion of exhaust gas can be circulated into the combustion chamber to restrict the production of nitrogen oxide. Also, exhaust gas re-introduced into the combustion chamber through the EGR line is cooled by heat of vaporization of fuel injected from the fuel injector thereby advantageously relieving the installation of an additional cooling system for cooling exhaust gas which is re-circulated into the combustion chamber.

Abstract: The present invention relates to a fuel injecting apparatus for an internal combustion engine, in which exhaust gas is applied to the injection of fuel. According to the fuel injecting apparatus, a portion of hot exhaust gas is introduced in front of the outlet of the fuel injector allowing hot exhaust gas to promote the fine particle formation and vaporization of fuel thereby enhancing efficiency of fuel. Again, a portion of exhaust gas can be circulated into the combustion chamber to restrict the production of nitrogen oxide. Also, exhaust gas re-introduced into the combustion chamber through the EGR line is cooled by heat of vaporization of fuel injected from the fuel injector thereby advantageously relieving the installation of an additional cooling system for cooling exhaust gas which is re-circulated into the combustion chamber.

Abstract: A trench DMOS device has a gate insulating layer on the bottom and sidewalls of the trench. The upper edges of the trench have an impurity injection region and are rounded. In addition, a first conductive layer is formed on the gate insulating layer, and a second conductive layer is formed on the first conductive layer and filled in the trench. The second conductive layer has different crystallization from the first conductive layer. As such the first conductive layer acts as a buffer between the gate insulating layer and the filled in second conductive layer. A method for fabricating a trench DMOS device includes the steps of forming an epitaxial layer on a semiconductor substrate. Then an impurity is injected into the epitaxial layer to form an impurity injection region. Then a trench is formed in the semiconductor substrate passing through the impurity injection region. Then a dry etching process is used to round the upper edges of the trench.