Patents by Inventor Dong-Soo Lim

Dong-Soo Lim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070006260
    Abstract: Disclosed is a method for providing an interactive digital broadcasting service in a mobile communication terminal for receiving digital broadcasting. Digital broadcasting signals including URL information of the digital broadcasting are received and outputted, the URL information from the received digital broadcasting signals is detected, a website of the digital broadcasting is accessed using the detected URL information when a broadcast information request for the digital broadcasting is received from a user, and broadcasting information provided from the website is displayed in a portion of a digital broadcasting output screen. Thus, while watching the digital broadcasting, users can access the Internet, retrieve information relating to broadcasting contents and state their opinion about broadcast programs.
    Type: Application
    Filed: June 1, 2006
    Publication date: January 4, 2007
    Applicant: Samsung Electronics Co., Ltd.
    Inventors: Jun Yoon, Hark-Sang Kim, Seok-Hyo Park, Young-Sik Park, Dong-Soo Lim, Jung-Hoon Park, Seung-Chul Choi
  • Publication number: 20050173067
    Abstract: Disclosed is a plasma etching chamber for completely dry-cleaning a film material and particles deposited at the periphery of a wafer through plasma etching while generating plasma at the top to the bottom sides of the periphery of the wafer. A pair of top and bottom anodes facing each other is placed around the periphery of the wafer under the application of radio frequency through a cathode. Alternatively, a top cathode and a bottom anode are placed around the periphery of the wafer while facing each other and a view-ring shields the area of the cathode, the anode and the wafer from the outside. A plasma etching system includes a plurality of the above-structured etching chambers. A handler takes wafers from a plurality of cassette stands or load ports, and posture-corrects the orientation frat locations of the wafers by a wafer alignment unit. The wafers are charged into the plasma etching chambers directly or via load lock chambers.
    Type: Application
    Filed: November 18, 2003
    Publication date: August 11, 2005
    Inventor: Dong-Soo Lim