Abstract: Provided is a substrate treating apparatus. The substrate treating apparatus according to embodiments of the present invention may include a cleaning chamber cleaning foreign objects on a substrate, and a recycling unit recycling by recovering a mixed solution including a first chemical and a second chemical used in cleaning of the substrate, wherein the recycling unit includes a separation unit separating the mixed solution recovered from the cleaning chamber, a recovery line connecting the separation unit and the cleaning chamber and allowing the mixed solution to flow into the separation unit, a decompression line having one end connected to the separation unit and exhausting the mixed solution evaporated from the separation unit, and a decompression unit installed in the decompression line and reducing pressure in the separation unit.

Abstract: Provided are a substrate support unit and a substrate treating apparatus and method using the same. The substrate support unit includes a first support part and a second support part. The first support part is movable in a first direction. The first support part supports a first portion of a substrate in which a processing fluid is supplied in a direction corresponding to the first direction. The second support part is movable in a second direction. The second support part supports a second portion of the substrate. At least one of the first support part and the second support part supports the substrate while the processing fluid is supplied.

Abstract: Provided are a substrate support unit and a substrate treating apparatus and method using the same. The substrate support unit includes a first support part and a second support part. The first support part is movable in a first direction. The first support part supports a first portion of a substrate in which a processing fluid is supplied in a direction corresponding to the first direction. The second support part is movable in a second direction. The second support part supports a second portion of the substrate. At least one of the first support part and the second support part supports the substrate while the processing fluid is supplied.