Abstract: In one example, a semiconductor device can comprise a substrate, a device stack, first and second internal interconnects, and an encapsulant. The substrate can comprise a first and second substrate sides opposite each other, a substrate outer sidewall between the first substrate side and the second substrate side, and a substrate inner sidewall defining a cavity between the first substrate side and the second substrate side. The device stack can be in the cavity and can comprise a first electronic device, and a second electronic device stacked on the first electronic device. The first internal interconnect can be coupled to the substrate and the device stack. The encapsulant can cover the substrate inner sidewall and the device stack and can fill the cavity. Other examples and related methods are disclosed herein.

Abstract: A plasma treatment apparatus for a workpiece includes a metal electrode, a capillary dielectric having first and second sides and coupled to the metal electrode through the first side, wherein the capillary dielectric has at least one capillary, a shield body surrounding the metal electrode and the first side of the capillary dielectric, wherein the shield body has first and second end portions, and a gas supplier providing gas to the metal electrode.

Abstract: A method and an apparatus for treating a workpiece using a plasma are disclosed in the present invention. In treating a workpiece using a plasma, the apparatus includes at least one pin electrode for receiving a power source, a dielectric body having first and second sides, wherein the first side is coupled to the pin electrode and the second side has at least one capillary extending to a direction of the first side of the dielectric body, and each capillary is substantially aligned with each pin electrode, and a counter electrode electrically coupled to the pin electrode for generating the plasma from each capillary.

Abstract: A method and an apparatus for treating a workpiece using a plasma discharge are disclosed in the present invention. In treating a workpiece using a plasma discharge, the apparatus includes at least one plate electrode electrically coupled to a power source, a dielectric body having first and second sides, wherein the first side is coupled to the at least one plate electrode and the second side has at least one capillary extending substantially therethrough in a direction of the first side of the dielectric body, and a counter electrode electrically coupled to the power source.

Abstract: The present invention discloses an ultraviolet light source driven by a capillary discharge plasma and a method for surface treatment using the same. More specifically, an ultraviolet light source driven by a capillary discharge plasma includes an AC power supply as a power source, at least one first electrode connected to the power source, a dielectric body having at least one capillary discharge site therein and enclosing at least a portion of the first electrode, wherein each capillary discharge site is substantially aligned with each first electrode, so that the first electrode is exposed by the capillary site, at least one second electrode electrically coupled to the first electrode, a gas tight chamber enclosing the first and second electrodes and the dielectric body including a working gas, and a window attached to the chamber substantially passing only ultraviolet light from a capillary discharge plasma.

Abstract: The present invention discloses a capillary discharge plasma display panel having a field shaping layer and a method of fabricating the same. More specifically, a capillary discharge panel for generating a capillary plasma discharge includes first and second substrates forming at least one discharge space there between, the first and second substrates facing into each other, a first electrode on the first substrate, a first dielectric layer on the first electrode including the first substrate, at least one second electrode on the second substrate, a second dielectric layer on the second electrode and having at least one capillary per each discharge space therein, and a field shaping layer on the second dielectric layer to confine a generated field into the capillary and eliminate a glow discharge, wherein the discharge space directly faces into the capillary and each capillary corresponds to each discharge space.

Abstract: In a method of driving a capillary discharge plasma display panel which comprises front and rear substrates forming a space discharge therein, an addressing electrode on the front substrate, a common electrode and a plurality of scanning electrodes on the rear substrate, and a dielectric layer covering the common electrode and the scanning electrodes and having a capillary corresponding to the common electrode and each scanning electrode in the second dielectric layer, the method includes the steps of applying an addressing pulse to the addressing electrode and a first pulse to the common electrode, and a second pulse sequentially from a 1st scanning electrode to an nth scanning electrode during an addressing period for selecting pixels to be turned on, and applying a first sustaining pulse to the common electrode and a second sustaining pulse to the 1st scanning electrode to the nth scanning electrode during a sustaining period, wherein the first and second sustaining pulses are applied for only discharge ti

Abstract: The present invention discloses an apparatus and method for sterilization of articles using capillary discharge atmospheric plasma. More specifically, an apparatus for sterilizing articles using substantially atmospheric pressure plasma includes a plasma generator generating the substantially atmospheric pressure plasma, wherein the plasma generator includes, first and second dielectrics facing into each other, wherein at least one capillary is formed in at least one of the dielectrics, and first and second electrodes on the first and second dielectric bodies, receiving the potential from the power supply, a processing chamber enclosing the plasma generator, and a power supply providing a potential to the plasma generator.

Abstract: An apparatus for sterilizing an article using capillary discharge atmospheric pressure plasma is disclosed. The apparatus includes a power supplier providing a potential to the apparatus, a plasma generating head, a gas supplier providing a sufficient amount of working gas to the plasma generating head, and a body including a handle and coupled to the plasma generating head and the gas supplier. The plasma generating head includes, a metal electrode receiving the potential, a dielectric having at least one capillary therein coupled to the metal electrode, and a shield body surrounding at least a portion of the metal electrode except for the capillary.

Abstract: A method and apparatus for treating a workpiece using capillary discharge plasma are disclosed in the present invention.

Abstract: A plasma apparatus for treating a fluid includes a fluid conduit, a first metal electrode and a second metal electrode mounted in the fluid conduit and receiving a potential, a capillary dielectric between the first and second metal electrodes, wherein the capillary dielectric has at least one capillary, a shield body surrounding at least a portion of the first metal electrode, and a gas supplier providing a sufficient amount of working gas to the first and second metal electrodes, thereby generating a continuous plasma shower within the conduit.

Abstract: A plasma treatment apparatus for a workpiece includes a metal electrode, a capillary dielectric having first and second sides and coupled to the metal electrode through the first side, wherein the capillary dielectric has at least one capillary, a shield body surrounding the metal electrode and the first side of the capillary dielectric, wherein the shield body has first and second end portions, and a gas supplier providing gas to the metal electrode.

Abstract: A method and an apparatus for treating a workpiece using a plasma are disclosed in the present invention. In treating a workpiece using a plasma, the apparatus includes at least one pin electrode for receiving a power source, a dielectric body having first and second sides, wherein the first side is coupled to the pin electrode and the second side has at least one capillary extending to a direction of the first side of the dielectric body, and each capillary is substantially aligned with each pin electrode, and a counter electrode electrically coupled to the pin electrode for generating the plasma from each capillary.