Patents by Inventor Dong Ye

Dong Ye has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PHOTOMASK AND METHOD FOR MANUFACTURING THE SAME
    Publication number: 20130316269
    Abstract: The present invention provides a photo-mask and a method for manufacturing the same. The method for manufacturing the photo-mask comprising: forming a shading pattern layer on a substrate; forming a protecting layer covering the shading pattern layer and the substrate; and; forming a reduced reflection layer on the protecting layer, wherein a refractive index of the protecting layer is greater than a refractive index of the reduced reflection layer. The present invention can mitigate a light reflection problem of a substrate of the conventional photo-mask.
    Type: Application
    Filed: June 8, 2012
    Publication date: November 28, 2013
    Applicant: Shenzhen China Star Optoelectronics Technology Co., Ltd.
    Inventors: Dong Ye, Liang Xu