Patents by Inventor Dong-Youn Shin

Dong-Youn Shin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20100151636
    Abstract: Disclosed are methods of making fine patterns by exploiting difference in threshold laser fluence of materials and a thin film transistor (TFT) fabrication methods using the same, and more particularly, to a method of forming a fine pattern and a method of fabricating a TFT through the same method, in which a plurality of layers different in threshold laser fluence are stacked and then exposed to a laser so that a layer having a low threshold laser fluence can be selectively removed, thereby making fine patterns precisely and forming a cavity of a gate electrode precisely and easily.
    Type: Application
    Filed: April 29, 2009
    Publication date: June 17, 2010
    Inventors: Dong-Youn SHIN, Taik-Min LEE, Dong-Soo KIM
  • Publication number: 20100133802
    Abstract: The present invention relates to a luminous advertisement sheet. The luminous advertisement sheet includes a light-transmitting print sheet having an EL advertisement region formed in at least one area of the print sheet, and a general advertisement region formed in the other area thereof. The EL advertisement region has at least one of a fixed pattern portion in which a transparent electrode layer, an EL layer and a dielectric layer are sequentially laminated and a variable pattern portion in which a transparent electrode layer, an EL layer, a dielectric layer and a plurality of pixel electrode layers are sequentially laminated. The general advertisement region allows general dye printing to be performed therein. The luminous advertisement sheet further includes a pattern electrode layer laminated and printed with a conductive ink material to have a predetermined luminous pattern in at least one area of the dielectric layer laminated in the fixed pattern portion and/or the variable pattern portion.
    Type: Application
    Filed: December 5, 2007
    Publication date: June 3, 2010
    Applicant: KOREA INSTITUTE OF MACHINERY & MATERIALS
    Inventors: Taik-Min Lee, Dong-Youn Shin, Chung-Hwan Kim, Jeong-Dai Jo, Dong-Soo Kim, Byung-Oh Choi
  • Publication number: 20100091107
    Abstract: The present invention discloses a high speed optical monitoring system being capable of monitoring clearly a subject at a high speed and having a small dimension.
    Type: Application
    Filed: December 2, 2008
    Publication date: April 15, 2010
    Applicant: KOREA INSTITUTE OF MACHINERY & MATERIALS
    Inventors: Dong Youn SHIN, Kyung Hyun HWANG, Taik Min LEE, Dong Soo KIM
  • Publication number: 20090142268
    Abstract: There is provided a novel chain-end functionalized PEO of formulas (I) to (IV) prepared via living anionic polymerization and chain-end functionalization, as well as a simple method of preparing nano-sized transition metal or metal salt particles using the same, which can be readily stabilized even in an aqueous medium. The water-soluble PEO-based polymers having various functional groups (including a drug group such as vitamin and anti-cancer agent) and the process of preparing nano-sized transition metal or metal salt particles using the same can be advantageously used in the development of new materials for drug delivering system and imaging, e.g., a contrast agent and an anti-cancer agent simultaneously.
    Type: Application
    Filed: July 6, 2006
    Publication date: June 4, 2009
    Applicant: Youl Chon Chemical Co., Ltd.
    Inventors: Jungahn Kim, Kwang Ung Kim, Seung Sang Hwang, Soon Man Hong, Soonjong Kwak, Joon Hyeong Park, Ji Hee Kim, Dong Youn Shin, Soon Geun Hwang, Jang Seop Kim, Han Wook Ryu
  • Patent number: 7517467
    Abstract: Disclosed herein is a method of forming a pattern, comprising: attaching a single-layer or multi-layer sacrificial film made of a semi-solid or solid material on part or all of the surface of a substrate; irradiating the sacrificial film with a focusable energy beam such as a laser beam to form a region to be charged with a functional material; charging the functional material into the formed region using a method such as an inkjet; drying the functional material; and removing the sacrificial film, thus obtaining the desired pattern.
    Type: Grant
    Filed: December 19, 2006
    Date of Patent: April 14, 2009
    Assignee: Korea Institute of Machinery & Materials
    Inventors: Dong-Youn Shin, Dong-Soo Kim, Chung-Hwan Kim, Taik-Min Lee, Jeong-Dai Jo, Byung-Oh Choi
  • Patent number: 7510951
    Abstract: A patterning method comprising (a) providing a substrate having a sacrificial layer made of a first material, partially or totally formed on the substrate, (b) forming pattern grooves, which are free from the first material and have a line width of a first resolution or lower, on the sacrificial layer by using a first means, by which the sacrificial layer is directly processed to form a line, (c) filling the pattern grooves with a second material to a second resolution by using a second means, to form a pattern of the second material on the substrate. This method provides a high-resolution pattern with little or no waste of the second material, thereby reducing production costs. The method uses first high resolution means, such as focused energy beams of laser, combined with a low resolution means, such as ink-jet, to efficiently provide a high-resolution pattern.
    Type: Grant
    Filed: May 11, 2006
    Date of Patent: March 31, 2009
    Assignee: LG Chem, Ltd.
    Inventors: Dong-Youn Shin, Bu Gon Shin
  • Patent number: 7462570
    Abstract: A patterning method comprising (a) providing a substrate having a sacrificial layer made of a first material, partially or totally formed on the substrate; (b) forming pattern grooves, which are free from the first material and have a line width of a first resolution or lower, on the sacrificial layer by using a first means; (c) filling the pattern grooves with a second material by using a second means; and (d) removing the first material present in a remaining sacrificial layer by way of irradiation or heating, wherein the first material has a threshold fluence of less than a threshold fluence of the second material, the first material is removed in step (d) under a dose ranging from the threshold fluence of the first material to that of the second material, and the pattern is formed on the substrate by the second material.
    Type: Grant
    Filed: May 11, 2006
    Date of Patent: December 9, 2008
    Assignee: LG Chem, Ltd.
    Inventors: Dong-Youn Shin, Tae Su Kim
  • Patent number: 7319127
    Abstract: Disclosed are nano-sized metals and metal salts stabilized by using semi-telechelic and telechelic polymers prepared through living anionic polymerization, and their synthetic methods, and a nanostructure wherein the nano-sized particles are self-assembled by mixing block copolymers and film-casting. The present invention provides a new method for preparing nano-sized particles capable of easily accomplishing nanostructure by merely mixing, especially with block copolymers, and having excellent stability.
    Type: Grant
    Filed: October 23, 2002
    Date of Patent: January 15, 2008
    Assignees: Korea Institute of Science and Technology
    Inventors: Jungahn Kim, Kwang Ung Kim, Seung Sang Hwang, Dong-Youn Shin, Jang Seop Kim, Soon-Geun Hwang, Keon Hyeong Kim
  • Publication number: 20070259474
    Abstract: Disclosed herein is a method of forming a pattern, comprising: attaching a single-layer or multi-layer sacrificial film made of a semi-solid or solid material on part or all of the surface of a substrate; irradiating the sacrificial film with a focusable energy beam such as a laser beam to form a region to be charged with a functional material; charging the functional material into the formed region using a method such as an inkjet; drying the functional material; and removing the sacrificial film, thus obtaining the desired pattern.
    Type: Application
    Filed: December 19, 2006
    Publication date: November 8, 2007
    Applicant: KOREAN INSTITUTE OF MACHINERY & MATERIALS
    Inventors: Dong-Youn SHIN, Dong-Soo KIM, Chung-Hwan KIM, Taik-Min LEE, Jeong-Dai JO, Byung-Oh CHOI
  • Publication number: 20070259293
    Abstract: Disclosed herein is a method for forming a pattern, comprising: attaching a single-layer or multi-layer dry film resist made of a semi-solid or solid material to part or all of the surface of a substrate; exposing the dry film resist to light either by irradiating a focusable energy beam directly onto the resist or by projecting a specific wavelength range of light onto the resist, to form a region to be filled with a functional material; charging the functional material into the formed region using a method such as inkjetting; drying the functional material; and removing the dry film resist, thus obtaining the desired pattern.
    Type: Application
    Filed: December 19, 2006
    Publication date: November 8, 2007
    Applicant: KOREA INSTITUTE OF MACHINERY & MATERIALS
    Inventors: Dong-Youn SHIN, Dong-Soo KIM, So-Nam YUN, Young-Bog HAM, Byung-Oh CHOI
  • Publication number: 20060281333
    Abstract: Disclosed is a method for forming a pattern which comprises the steps of: (a) providing a substrate having a sacrificial layer made of a first material, partially or totally formed on the substrate; (b) forming pattern grooves, which are free from the first material and have a line width of a first resolution or lower, on the sacrificial layer by using a first means, by which the sacrificial layer is directly processed to form a line; (c) filling the pattern grooves with a second material to a second resolution by using a second means, to form a pattern of the second material on the substrate. A substrate having a pre-pattern formed by the method is also disclosed. The method for forming a pattern provides a high-resolution pattern with little or no waste of the second material, thereby reducing production costs.
    Type: Application
    Filed: May 11, 2006
    Publication date: December 14, 2006
    Applicant: LG Chem, Ltd.
    Inventors: Dong-Youn Shin, Bu Gon Shin
  • Publication number: 20060281334
    Abstract: Disclosed is a method for forming a pattern, which comprises the steps of: (a) providing a substrate having a sacrificial layer made of a first material, partially or totally formed on the substrate; (b) forming pattern grooves, which are free from the first material and have a line width of a first resolution or lower, on the sacrificial layer by using a first means; (c) filling the pattern grooves with a second material by using a second means; and (d) removing the first material present in a remaining sacrificial layer by way of irradiation or heating, wherein the first material has a threshold fluence of less than a threshold fluence of the second material, the first material is removed in step (d) under a dose ranging from the threshold fluence of the first material to that of the second material, and the pattern is formed on the substrate by the second material. A substrate having a pre-pattern formed by the method is also disclosed.
    Type: Application
    Filed: May 11, 2006
    Publication date: December 14, 2006
    Applicant: LG Chem, Ltd.
    Inventors: Dong-Youn Shin, Tae Su Kim
  • Patent number: 6784266
    Abstract: The present invention relates to a process for preparing copolymer hydrogels with controlled molecular weights and having both thermo- and pH-responsive properties, wherein the process comprises the steps of (a) providing sulfonamide type styrenic or (meth)acrylamide-based monomers exhibiting different pKa values; (b) providing poly(N-isopropylacrylamide) or crosslinked poly(N-isopropylacrylamide-co-methylene bisacrylamide) hydrogels having thermo-responsive properties; and (c) providing several hydrogels exhibiting pH-sensitive properties and random or block copolymerizations of the sulfonamide type styrenic or (meth)acrylamide-based monomers prepared in step (a) with N-isopropylacrylamide and/or methylene bisacrylamide monomers used in step (b) in a polar or non-polar solvent; wherein said steps (b) and (c) are carried out by controlled/living radical polymerization using alkyl halides as the initiators and the transition metals with phosphine or amine ligands as the catalysts.
    Type: Grant
    Filed: October 28, 2002
    Date of Patent: August 31, 2004
    Assignees: Korea Institute of Science and Technology, Youl Chon Chemical Co., Inc.
    Inventors: Jungahn Kim, Kwang Ung Kim, Sang Seob Kim, Keon Hyeong Kim, Dong-Youn Shin, Soon-Geun Hwang, Jang Seop Kim
  • Publication number: 20040030019
    Abstract: Disclosed are nano-sized metals and metal salts stabilized by using semi-telechelic and telechelic polymers prepared through living anionic polymerization, and their synthetic methods, and a nanostructure wherein the nano-sized particles are self-assembled by mixing block copolymers and film-casting. The present invention provides a new method for preparing nano-sized particles capable of easily accomplishing nanostructure by merely mixing, especially with block copolymers, and having excellent stability.
    Type: Application
    Filed: October 23, 2002
    Publication date: February 12, 2004
    Inventors: Jungahn Kim, Kwang Ung Kim, Seung Sang Hwang, Dong-Youn Shin, Jang Seop Kim, Soon-Geun Hwang, Keon Hyeong Kim
  • Publication number: 20040024096
    Abstract: The present invention relates to a process for preparing copolymer hydrogels with controlled molecular weights and having both thermo- and pH-responsive properties, wherein the process comprises the steps of (a) providing sulfonamide type styrenic or (meth)acrylamide-based monomers exhibiting different pKa values; (b) providing poly(N-isopropylacrylamide) or crosslinked poly(N-isopropylacrylamide-co-methylene bisacrylamide) hydrogels having thermo-responsive properties; and (c) providing several hydrogels exhibiting pH-sensitive properties and random or block copolymerizations of the sulfonamide type styrenic or (meth)acrylamide-based monomers prepared in step (a) with N-isopropylacrylamide and/or methylene bisacrylamide monomers used in step (b) in a polar or non-polar solvent; wherein said steps (b) and (c) are carried out by controlled/living radical polymerization using alkyl halides as the initiators and the transition metals with phosphine or amine ligands as the catalysts.
    Type: Application
    Filed: October 28, 2002
    Publication date: February 5, 2004
    Inventors: Jungahn Kim, Kwang Ung Kim, Sang Seob Kim, Keon Hyeong Kim, Dong-Youn Shin, Soon-Geun Hwang, Jang Seop Kim