Patents by Inventor Dongchan Bae

Dongchan Bae has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Composition for removing a photoresist and method of manufacturing semiconductor device using the composition
    Patent number: 8486880
    Abstract: Provided are a composition for removing a photoresist and a method of manufacturing a semiconductor device using the composition. The composition includes about 60-90 wt % of dimethyl sulfoxide, about 10-30 wt % of a polar organic solvent, about 0.5-1.5 wt % of hydroxy alkyl ammonium and about 1-10 wt % of an amine containing no hydroxyl group.
    Type: Grant
    Filed: November 14, 2011
    Date of Patent: July 16, 2013
    Assignees: Samsung Electronics Co., Ltd., Cheil Industries Inc.
    Inventors: Dong-Min Kang, Dongchan Bae, Kyoochul Cho, Baiksoon Choi, Seunghyun Ahn, Myungkook Park, Goun Kim
  • COMPOSITION FOR REMOVING A PHOTORESIST AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE COMPOSITION
    Publication number: 20120058636
    Abstract: Provided are a composition for removing a photoresist and a method of manufacturing a semiconductor device using the composition. The composition includes about 60-90 wt % of dimethyl sulfoxide, about 10-30 wt % of a polar organic solvent, about 0.5-1.5 wt % of hydroxy alkyl ammonium and about 1-10 wt % of an amine containing no hydroxyl group.
    Type: Application
    Filed: November 14, 2011
    Publication date: March 8, 2012
    Inventors: Dong-Min KANG, Dongchan Bae, Kyoochul Cho, Baiksoon Choi, Seunghyun Ahn, Myungkook Park, Goun Kim
  • Composition for removing a photoresist and method of manufacturing semiconductor device using the composition
    Patent number: 8058221
    Abstract: Provided are a composition for removing a photoresist and a method of manufacturing a semiconductor device using the composition. The composition includes about 60-90 wt % of dimethyl sulfoxide, about 10-30 wt % of a polar organic solvent, about 0.5-1.5 wt % of hydroxy alkyl ammonium and about 1-10 wt % of an amine containing no hydroxyl group.
    Type: Grant
    Filed: April 6, 2011
    Date of Patent: November 15, 2011
    Assignees: Samsung Electronics Co., Ltd., Cheil Industries Inc.
    Inventors: Dong-Min Kang, Dongchan Bae, Kyoochul Cho, Baiksoon Choi, Seunghyun Ahn, Myungkook Park, Goun Kim
  • COMPOSITION FOR REMOVING A PHOTORESIST AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE COMPOSITION
    Publication number: 20110245128
    Abstract: Provided are a composition for removing a photoresist and a method of manufacturing a semiconductor device using the composition. The composition includes about 60-90 wt % of dimethyl sulfoxide, about 10-30 wt % of a polar organic solvent, about 0.5-1.5 wt % of hydroxy alkyl ammonium and about 1-10 wt % of an amine containing no hydroxyl group.
    Type: Application
    Filed: April 6, 2011
    Publication date: October 6, 2011
    Applicants: Samsung Electronics Co., Ltd., Cheil Industries Inc.
    Inventors: Dong-Min KANG, Dongchan Bae, Kyoochul Cho, Baiksoon Choi, Seunghyun Ahn, Myungkook Park, Goun Kim